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Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions

[Image: see text] We present the synthesis of new shapes of colloidal silica particles by manipulating their chemical composition and subsequent etching. Segments of silica rods, prepared by the ammonia catalyzed hydrolysis and condensation of tetraethylorthosilicate (TEOS) from polyvinylpyrrolidone...

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Autores principales: Hagemans, Fabian, Vlug, Wessel, Raffaelli, Chiara, van Blaaderen, Alfons, Imhof, Arnout
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5390506/
https://www.ncbi.nlm.nih.gov/pubmed/28413261
http://dx.doi.org/10.1021/acs.chemmater.7b00687
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author Hagemans, Fabian
Vlug, Wessel
Raffaelli, Chiara
van Blaaderen, Alfons
Imhof, Arnout
author_facet Hagemans, Fabian
Vlug, Wessel
Raffaelli, Chiara
van Blaaderen, Alfons
Imhof, Arnout
author_sort Hagemans, Fabian
collection PubMed
description [Image: see text] We present the synthesis of new shapes of colloidal silica particles by manipulating their chemical composition and subsequent etching. Segments of silica rods, prepared by the ammonia catalyzed hydrolysis and condensation of tetraethylorthosilicate (TEOS) from polyvinylpyrrolidone loaded water droplets, were grown under different conditions. Upon decreasing temperature, delaying ethanol addition, or increasing monomer concentration, the rate of dissolution of the silica segment subsequently formed decreased. A watery solution of NaOH (∼mM) selectively etched these segments. Further tuning the conditions resulted in rod–cone or cone–cone shapes. Deliberately modulating the composition along the particle’s length by delayed addition of (3-aminopropyl)-triethoxysilane (APTES) also allowed us to change the composition stepwise. The faster etching of this coupling agent in neutral conditions or HF afforded an even larger variety of particle morphologies while in addition changing the chemical functionality. A comparable step in composition was applied to silica spheres. Biamine functional groups used in a similar way as APTES caused a charge inversion during the growth, causing dumbbells and higher order aggregates to form. These particles etched more slowly at the neck, resulting in a biconcave silica ring sandwiched between two silica spheres, which could be separated by specifically etching the functionalized layer using HF.
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spelling pubmed-53905062017-04-14 Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions Hagemans, Fabian Vlug, Wessel Raffaelli, Chiara van Blaaderen, Alfons Imhof, Arnout Chem Mater [Image: see text] We present the synthesis of new shapes of colloidal silica particles by manipulating their chemical composition and subsequent etching. Segments of silica rods, prepared by the ammonia catalyzed hydrolysis and condensation of tetraethylorthosilicate (TEOS) from polyvinylpyrrolidone loaded water droplets, were grown under different conditions. Upon decreasing temperature, delaying ethanol addition, or increasing monomer concentration, the rate of dissolution of the silica segment subsequently formed decreased. A watery solution of NaOH (∼mM) selectively etched these segments. Further tuning the conditions resulted in rod–cone or cone–cone shapes. Deliberately modulating the composition along the particle’s length by delayed addition of (3-aminopropyl)-triethoxysilane (APTES) also allowed us to change the composition stepwise. The faster etching of this coupling agent in neutral conditions or HF afforded an even larger variety of particle morphologies while in addition changing the chemical functionality. A comparable step in composition was applied to silica spheres. Biamine functional groups used in a similar way as APTES caused a charge inversion during the growth, causing dumbbells and higher order aggregates to form. These particles etched more slowly at the neck, resulting in a biconcave silica ring sandwiched between two silica spheres, which could be separated by specifically etching the functionalized layer using HF. American Chemical Society 2017-03-17 2017-04-11 /pmc/articles/PMC5390506/ /pubmed/28413261 http://dx.doi.org/10.1021/acs.chemmater.7b00687 Text en Copyright © 2017 American Chemical Society This is an open access article published under a Creative Commons Non-Commercial No Derivative Works (CC-BY-NC-ND) Attribution License (http://pubs.acs.org/page/policy/authorchoice_ccbyncnd_termsofuse.html) , which permits copying and redistribution of the article, and creation of adaptations, all for non-commercial purposes.
spellingShingle Hagemans, Fabian
Vlug, Wessel
Raffaelli, Chiara
van Blaaderen, Alfons
Imhof, Arnout
Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions
title Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions
title_full Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions
title_fullStr Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions
title_full_unstemmed Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions
title_short Sculpting Silica Colloids by Etching Particles with Nonuniform Compositions
title_sort sculpting silica colloids by etching particles with nonuniform compositions
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5390506/
https://www.ncbi.nlm.nih.gov/pubmed/28413261
http://dx.doi.org/10.1021/acs.chemmater.7b00687
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AT vanblaaderenalfons sculptingsilicacolloidsbyetchingparticleswithnonuniformcompositions
AT imhofarnout sculptingsilicacolloidsbyetchingparticleswithnonuniformcompositions