Evaluation of Dynamic Disulphide/Thiol Homeostasis in Silica Exposed Workers

BACKGROUND: Oxidative stress is implicated as one of the main molecular mechanism underlying silicosis. AIMS: In this study, our aim was to asses the redox status in occupationally silica-exposed workers, by evaluating the dynamic thiol-disulphide homeostasis. STUDY DESIGN: Case-control study. METHO...

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Detalles Bibliográficos
Autores principales: Gündüzöz, Meşide, Bal, Ceylan, Büyükşekerci, Murat, Neşelioğlu, Salim, Nadir Öziş, Türkan, İritaş, Servet, Kara, Halil, Erel, Özcan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Galenos Publishing 2017
Materias:
Original Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5394289/
https://www.ncbi.nlm.nih.gov/pubmed/28418335
http://dx.doi.org/10.4274/balkanmedj.2015.1632

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5394289/
https://www.ncbi.nlm.nih.gov/pubmed/28418335
http://dx.doi.org/10.4274/balkanmedj.2015.1632

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