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Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate
In this work, fully transparent high performance double-channel indium-tin-oxide/Al–Sn–Zn–O thin-film transistors (ITO/ATZO TFTs) are successfully fabricated on glass by radio frequency (RF) magnetron sputtering. The ITO layer acts as the bottom channel layer to increase the channel carrier concentr...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5431434/ https://www.ncbi.nlm.nih.gov/pubmed/28473695 http://dx.doi.org/10.1038/s41598-017-01691-7 |
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author | Cong, Yingying Han, Dedong Dong, Junchen Zhang, Shengdong Zhang, Xing Wang, Yi |
author_facet | Cong, Yingying Han, Dedong Dong, Junchen Zhang, Shengdong Zhang, Xing Wang, Yi |
author_sort | Cong, Yingying |
collection | PubMed |
description | In this work, fully transparent high performance double-channel indium-tin-oxide/Al–Sn–Zn–O thin-film transistors (ITO/ATZO TFTs) are successfully fabricated on glass by radio frequency (RF) magnetron sputtering. The ITO layer acts as the bottom channel layer to increase the channel carrier concentration. The top ATZO channel layer, which is deposited via high oxygen partial pressure in the sputtering process, is useful to control the minimum off-state current. After annealing, the ITO/ATZO TFT demonstrates outstanding electrical performances, including a high ON/OFF current ratio (I(on)/I(off)) of 3.5 × 10(8), a steep threshold swing (SS) of 142.2 mV/decade, a superior saturation mobility (μ(sat)) of 246.0 cm(2)/Vs, and a threshold voltage V(T) of 0.5 V. The operation mechanisms for double-channel structures are also clarified. |
format | Online Article Text |
id | pubmed-5431434 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-54314342017-05-16 Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate Cong, Yingying Han, Dedong Dong, Junchen Zhang, Shengdong Zhang, Xing Wang, Yi Sci Rep Article In this work, fully transparent high performance double-channel indium-tin-oxide/Al–Sn–Zn–O thin-film transistors (ITO/ATZO TFTs) are successfully fabricated on glass by radio frequency (RF) magnetron sputtering. The ITO layer acts as the bottom channel layer to increase the channel carrier concentration. The top ATZO channel layer, which is deposited via high oxygen partial pressure in the sputtering process, is useful to control the minimum off-state current. After annealing, the ITO/ATZO TFT demonstrates outstanding electrical performances, including a high ON/OFF current ratio (I(on)/I(off)) of 3.5 × 10(8), a steep threshold swing (SS) of 142.2 mV/decade, a superior saturation mobility (μ(sat)) of 246.0 cm(2)/Vs, and a threshold voltage V(T) of 0.5 V. The operation mechanisms for double-channel structures are also clarified. Nature Publishing Group UK 2017-05-04 /pmc/articles/PMC5431434/ /pubmed/28473695 http://dx.doi.org/10.1038/s41598-017-01691-7 Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Cong, Yingying Han, Dedong Dong, Junchen Zhang, Shengdong Zhang, Xing Wang, Yi Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate |
title | Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate |
title_full | Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate |
title_fullStr | Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate |
title_full_unstemmed | Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate |
title_short | Fully transparent high performance thin film transistors with bilayer ITO/Al-Sn-Zn-O channel structures fabricated on glass substrate |
title_sort | fully transparent high performance thin film transistors with bilayer ito/al-sn-zn-o channel structures fabricated on glass substrate |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5431434/ https://www.ncbi.nlm.nih.gov/pubmed/28473695 http://dx.doi.org/10.1038/s41598-017-01691-7 |
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