Operando SXRD study of the structure and growth process of Cu(2)S ultra-thin films

Electrochemical Atomic Layer Deposition (E-ALD) technique has demonstrated to be a suitable process for growing compound semiconductors, by alternating the under-potential deposition (UPD) of the metallic element with the UPD of the non-metallic element. The cycle can be repeated several times to bu...

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Detalles Bibliográficos
Autores principales: Giaccherini, Andrea, Cinotti, Serena, Guerri, Annalisa, Carlà, Francesco, Montegrossi, Giordano, Vizza, Francesco, Lavacchi, Alessandro, Felici, Roberto, Di Benedetto, Francesco, Innocenti, Massimo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5431668/
https://www.ncbi.nlm.nih.gov/pubmed/28487534
http://dx.doi.org/10.1038/s41598-017-01717-0

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5431668/
https://www.ncbi.nlm.nih.gov/pubmed/28487534
http://dx.doi.org/10.1038/s41598-017-01717-0

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