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Influence of NH(3) plasma and Ti doping on pH-sensitive CeO(2) electrolyte-insulator-semiconductor biosensors

In this study, CeO(2) pH-sensitive sensing membranes in electrolyte-insulator-semiconductor structures on silicon substrate were fabricated. To enhance sensing performance, the membrane underwent Ti doping and NH(3) plasma treatment on the surface. To examine the effects of Ti doping and plasma trea...

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Detalles Bibliográficos
Autores principales: Kao, Chyuan-Haur, Chang, Che-Wei, Tzu Chen, Yu, Ming Su, Wei, Cheng Lu, Chien, Lin, Chan-Yu, Chen, Hsiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445090/
https://www.ncbi.nlm.nih.gov/pubmed/28546585
http://dx.doi.org/10.1038/s41598-017-02692-2
Descripción
Sumario:In this study, CeO(2) pH-sensitive sensing membranes in electrolyte-insulator-semiconductor structures on silicon substrate were fabricated. To enhance sensing performance, the membrane underwent Ti doping and NH(3) plasma treatment on the surface. To examine the effects of Ti doping and plasma treatment, multiple material properties evaluations were conducted using field-emission scanning electron microscopy, X-ray diffraction, atomic force microscopy, and secondary ion mass spectroscopy. Results indicate that Ti doping and plasma treatment can remove defects and enhance crystallization, thereby achieving improved pH-sensing performance of the membrane with high sensitivity, high linearity, low hysteresis voltage and low drift voltage. CeO(2)-based EIS membranes with Ti doping and NH(3) plasma treatment show promise for future portable pH-sensitive biosensors.