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Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method

A three-level six-factor (arc power, substrate temperature, pre-treatment bias voltage, working pressure, deposition bias voltage and pretreatment time) orthogonal experimental array (L18) to optimize the adhesion strength of arc ion plating (AIP) TiAlN films was designed using the Taguchi method. A...

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Detalles Bibliográficos
Autores principales:	Joo, Yun-Kon, Zhang, Shi-Hong, Yoon, Jae-Hong, Cho, Tong-Yul
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Molecular Diversity Preservation International 2009
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445707/ http://dx.doi.org/10.3390/ma2020699

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