A Large-Area Nanoplasmonic Sensor Fabricated by Rapid Thermal Annealing Treatment for Label-Free and Multi-Point Immunoglobulin Sensing

Immunoglobulins are important biomarkers to evaluate the immune status or development of infectious diseases. To provide timely clinical treatments, it is important to continuously monitor the level of multiple immunoglobulins. Localized surface plasmon resonance (LSPR)-based nanoplasmonic sensors have been demonstrated for multiplex immunoglobulins detection. However, the sensor fabrication process is usually slow and complicated, so it is not accessible for large-area and batch fabrication. Herein, we report a large-area (2 cm × 2 cm) nanofabrication method using physical vapor deposition followed by a rapid thermal annealing treatment. To optimize the sensor performance, we systematically characterized three fabrication conditions, including (1) the deposition thickness; (2) the maximum annealing temperature, and (3) the annealing time. The corresponding absorbance spectrum profile and surface morphology of the nanostructures were observed by a UV-VIS spectrometer and atomic force microscopy. We then tested the sensitivity of the sensor using a glucose solution at different concentrations. The results showed that the sensor with 10 nm gold deposition thickness under 5-min 900 °C rapid thermal annealing can achieve the highest sensitivity (189 nm RIU(−1)). Finally, we integrated this nanoplasmonic sensor with a microchannel and a motorized stage to perform a 10-spot immunoglobulin detection in 50 min. Based on its real-time, dynamic and multi-point analyte detection capability, the nanoplasmonic sensor has the potential to be applied in high-throughput or multiplex immunoassay analysis, which would be beneficial for disease diagnosis or biomedical research in a simple and cost-effective platform.