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Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography
Anti-reflective coatings (ARCs) are used to lower the reflection of light on the surface of a substrate. Here, we demonstrate that the two main drawbacks of moth eye-structured ARCs—i.e., the lack of suitable coating materials and a process for large area, high volume applications—can be largely eli...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2013
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5452668/ https://www.ncbi.nlm.nih.gov/pubmed/28788301 http://dx.doi.org/10.3390/ma6093710 |
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author | Burghoorn, Marieke Roosen-Melsen, Dorrit de Riet, Joris Sabik, Sami Vroon, Zeger Yakimets, Iryna Buskens, Pascal |
author_facet | Burghoorn, Marieke Roosen-Melsen, Dorrit de Riet, Joris Sabik, Sami Vroon, Zeger Yakimets, Iryna Buskens, Pascal |
author_sort | Burghoorn, Marieke |
collection | PubMed |
description | Anti-reflective coatings (ARCs) are used to lower the reflection of light on the surface of a substrate. Here, we demonstrate that the two main drawbacks of moth eye-structured ARCs—i.e., the lack of suitable coating materials and a process for large area, high volume applications—can be largely eliminated, paving the way for cost-efficient and large-scale production of durable moth eye-structured ARCs on polymer substrates. We prepared moth eye coatings on polymethylmethacrylate (PMMA) and polycarbonate using wafer-by-wafer step-and-flash nano-imprint lithography (NIL). The reduction in reflection in the visible field achieved with these coatings was 3.5% and 4.0%, respectively. The adhesion of the coating to both substrates was good. The moth eye coating on PMMA demonstrated good performance in three prototypical accelerated ageing tests. The pencil hardness of the moth eye coatings on both substrates was <4B, which is less than required for most applications and needs further optimization. Additionally, we developed a roll-to-roll UV NIL pilot scale process and produced moth eye coatings on polyethylene terephthalate (PET) at line speeds up to two meters per minute. The resulting coatings showed a good replication of the moth eye structures and, consequently, a lowering in reflection of the coated PET of 3.0%. |
format | Online Article Text |
id | pubmed-5452668 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2013 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-54526682017-07-28 Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography Burghoorn, Marieke Roosen-Melsen, Dorrit de Riet, Joris Sabik, Sami Vroon, Zeger Yakimets, Iryna Buskens, Pascal Materials (Basel) Article Anti-reflective coatings (ARCs) are used to lower the reflection of light on the surface of a substrate. Here, we demonstrate that the two main drawbacks of moth eye-structured ARCs—i.e., the lack of suitable coating materials and a process for large area, high volume applications—can be largely eliminated, paving the way for cost-efficient and large-scale production of durable moth eye-structured ARCs on polymer substrates. We prepared moth eye coatings on polymethylmethacrylate (PMMA) and polycarbonate using wafer-by-wafer step-and-flash nano-imprint lithography (NIL). The reduction in reflection in the visible field achieved with these coatings was 3.5% and 4.0%, respectively. The adhesion of the coating to both substrates was good. The moth eye coating on PMMA demonstrated good performance in three prototypical accelerated ageing tests. The pencil hardness of the moth eye coatings on both substrates was <4B, which is less than required for most applications and needs further optimization. Additionally, we developed a roll-to-roll UV NIL pilot scale process and produced moth eye coatings on polyethylene terephthalate (PET) at line speeds up to two meters per minute. The resulting coatings showed a good replication of the moth eye structures and, consequently, a lowering in reflection of the coated PET of 3.0%. MDPI 2013-08-27 /pmc/articles/PMC5452668/ /pubmed/28788301 http://dx.doi.org/10.3390/ma6093710 Text en © 2013 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/). |
spellingShingle | Article Burghoorn, Marieke Roosen-Melsen, Dorrit de Riet, Joris Sabik, Sami Vroon, Zeger Yakimets, Iryna Buskens, Pascal Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography |
title | Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography |
title_full | Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography |
title_fullStr | Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography |
title_full_unstemmed | Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography |
title_short | Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography |
title_sort | single layer broadband anti-reflective coatings for plastic substrates produced by full wafer and roll-to-roll step-and-flash nano-imprint lithography |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5452668/ https://www.ncbi.nlm.nih.gov/pubmed/28788301 http://dx.doi.org/10.3390/ma6093710 |
work_keys_str_mv | AT burghoornmarieke singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography AT roosenmelsendorrit singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography AT derietjoris singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography AT sabiksami singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography AT vroonzeger singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography AT yakimetsiryna singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography AT buskenspascal singlelayerbroadbandantireflectivecoatingsforplasticsubstratesproducedbyfullwaferandrolltorollstepandflashnanoimprintlithography |