Cargando…
In Situ Hall Effect Monitoring of Vacuum Annealing of In(2)O(3):H Thin Films
Hydrogen doped In(2)O(3) thin films were prepared by room temperature sputter deposition with the addition of H(2)O to the sputter gas. By subsequent vacuum annealing, the films obtain high mobility up to 90 cm(2)/Vs. The films were analyzed in situ by X-ray photoelectron spectroscopy (XPS) and ex s...
Autores principales: | Wardenga, Hans F., Frischbier, Mareike V., Morales-Masis, Monica, Klein, Andreas |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2015
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455274/ https://www.ncbi.nlm.nih.gov/pubmed/28787957 http://dx.doi.org/10.3390/ma8020561 |
Ejemplares similares
-
In Situ Monitoring of Pulsed Laser Annealing of Eu-Doped Oxide Thin Films
por: Novotný, Michal, et al.
Publicado: (2021) -
Tunability of MoO(3) Thin-Film Properties
Due to Annealing in Situ Monitored by Hard X-ray Photoemission
por: Liao, Xiaxia, et al.
Publicado: (2019) -
Influence of Ti Content on the Partial Oxidation of Ti(x)FeCoNi Thin Films in Vacuum Annealing
por: Yang, Ya-Chu, et al.
Publicado: (2017) -
Structure Modification, Evolution, and Compositional Changes of Highly Conductive La:BaSnO(3) Thin Films Annealed in Vacuum and Air Atmosphere
por: Murauskas, Tomas, et al.
Publicado: (2022) -
Vacuum deposition of thin films
por: Holland, Leslie
Publicado: (1956)