Cargando…
Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm
Flash memory is the most widely used non-volatile memory device nowadays. In order to keep up with the demand for increased memory capacities, flash memory has been continuously scaled to smaller and smaller dimensions. The main benefits of down-scaling cell size and increasing integration are that...
Autores principales: | Zhao, Chun, Zhao, Ce Zhou, Taylor, Stephen, Chalker, Paul R. |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2014
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455833/ https://www.ncbi.nlm.nih.gov/pubmed/28788122 http://dx.doi.org/10.3390/ma7075117 |
Ejemplares similares
-
Dielectric relaxation of high-k oxides
por: Zhao, Chun, et al.
Publicado: (2013) -
Grain size dependence of dielectric relaxation in cerium oxide as high-k layer
por: Zhao, Chun, et al.
Publicado: (2013) -
Channel and source coding for non-volatile flash memories
por: Rajab, Mohammed
Publicado: (2020) -
Non-Volatile Transistor Memory with a Polypeptide Dielectric
por: Liang, Lijuan, et al.
Publicado: (2020) -
Non-volatile optoelectronic memory based on a photosensitive dielectric
por: Zhu, Rui, et al.
Publicado: (2023)