Cargando…

Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition

Dense and crack-free barium titanate (BaTiO(3), BTO) thin films with a thickness of less than 4 μm were prepared by using sub-micrometric scale, layer-by-layer electrohydrodynamic jet (E-jet) deposition of the suspension ink which is composed of BTO nanopowder and BTO sol. Impacts of the jet height...

Descripción completa

Detalles Bibliográficos
Autores principales: Liang, Junsheng, Li, Pengfei, Wang, Dazhi, Fang, Xu, Ding, Jiahong, Wu, Junxiong, Tang, Chang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456538/
https://www.ncbi.nlm.nih.gov/pubmed/28787860
http://dx.doi.org/10.3390/ma9010061
_version_ 1783241292776472576
author Liang, Junsheng
Li, Pengfei
Wang, Dazhi
Fang, Xu
Ding, Jiahong
Wu, Junxiong
Tang, Chang
author_facet Liang, Junsheng
Li, Pengfei
Wang, Dazhi
Fang, Xu
Ding, Jiahong
Wu, Junxiong
Tang, Chang
author_sort Liang, Junsheng
collection PubMed
description Dense and crack-free barium titanate (BaTiO(3), BTO) thin films with a thickness of less than 4 μm were prepared by using sub-micrometric scale, layer-by-layer electrohydrodynamic jet (E-jet) deposition of the suspension ink which is composed of BTO nanopowder and BTO sol. Impacts of the jet height and line-to-line pitch of the deposition on the micro-structure of BTO thin films were investigated. Results show that crack-free BTO thin films can be prepared with 4 mm jet height and 300 μm line-to-line pitch in this work. Dielectric constant of the prepared BTO thin film was recorded as high as 2940 at 1 kHz at room temperature. Meanwhile, low dissipation factor of the BTO thin film of about 8.6% at 1 kHz was also obtained. The layer-by-layer E-jet deposition technique developed in this work has been proved to be a cost-effective, flexible and easy to control approach for the preparation of high-quality solid thin film.
format Online
Article
Text
id pubmed-5456538
institution National Center for Biotechnology Information
language English
publishDate 2016
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-54565382017-07-28 Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition Liang, Junsheng Li, Pengfei Wang, Dazhi Fang, Xu Ding, Jiahong Wu, Junxiong Tang, Chang Materials (Basel) Article Dense and crack-free barium titanate (BaTiO(3), BTO) thin films with a thickness of less than 4 μm were prepared by using sub-micrometric scale, layer-by-layer electrohydrodynamic jet (E-jet) deposition of the suspension ink which is composed of BTO nanopowder and BTO sol. Impacts of the jet height and line-to-line pitch of the deposition on the micro-structure of BTO thin films were investigated. Results show that crack-free BTO thin films can be prepared with 4 mm jet height and 300 μm line-to-line pitch in this work. Dielectric constant of the prepared BTO thin film was recorded as high as 2940 at 1 kHz at room temperature. Meanwhile, low dissipation factor of the BTO thin film of about 8.6% at 1 kHz was also obtained. The layer-by-layer E-jet deposition technique developed in this work has been proved to be a cost-effective, flexible and easy to control approach for the preparation of high-quality solid thin film. MDPI 2016-01-19 /pmc/articles/PMC5456538/ /pubmed/28787860 http://dx.doi.org/10.3390/ma9010061 Text en © 2016 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons by Attribution (CC-BY) license http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Liang, Junsheng
Li, Pengfei
Wang, Dazhi
Fang, Xu
Ding, Jiahong
Wu, Junxiong
Tang, Chang
Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition
title Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition
title_full Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition
title_fullStr Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition
title_full_unstemmed Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition
title_short Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition
title_sort fabrication of crack-free barium titanate thin film with high dielectric constant using sub-micrometric scale layer-by-layer e-jet deposition
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456538/
https://www.ncbi.nlm.nih.gov/pubmed/28787860
http://dx.doi.org/10.3390/ma9010061
work_keys_str_mv AT liangjunsheng fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition
AT lipengfei fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition
AT wangdazhi fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition
AT fangxu fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition
AT dingjiahong fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition
AT wujunxiong fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition
AT tangchang fabricationofcrackfreebariumtitanatethinfilmwithhighdielectricconstantusingsubmicrometricscalelayerbylayerejetdeposition