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Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C(2)H(m)/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection a...

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Detalles Bibliográficos
Autores principales: Chandrashekaraiah, Thejaswini Halethimmanahally, Bogdanowicz, Robert, Rühl, Eckart, Danilov, Vladimir, Meichsner, Jürgen, Thierbach, Steffen, Hippler, Rainer
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456880/
https://www.ncbi.nlm.nih.gov/pubmed/28773715
http://dx.doi.org/10.3390/ma9070594
Descripción
Sumario:Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C(2)H(m)/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS), Raman spectroscopy, and ellipsometry. FT-IRRAS revealed the presence of sp(3) and sp(2) C–H stretching and C–H bending vibrations of bonds in the films. The presence of D and G bands was confirmed by Raman spectroscopy. Thin films obtained from C(2)H(4)/Ar and C(2)H(6)/Ar gas mixtures have I(D)/I(G) ratios of 0.45 and 0.3, respectively. The refractive indices were 2.8 and 3.1 for C(2)H(4)/Ar and C(2)H(6)/Ar films, respectively, at a photon energy of 2 eV.