Unraveling the Morphological Evolution and Etching Kinetics of Porous Silicon Nanowires During Metal-Assisted Chemical Etching

Many potential applications of porous silicon nanowires (SiNWs) fabricated with metal-assisted chemical etching are highly dependent on the precise control of morphology for device optimization. However, the effects of key etching parameters, such as the amount of deposited metal catalyst, HF–oxidan...

Descripción completa

Detalles Bibliográficos
Autores principales: Vinzons, Lester U., Shu, Lei, Yip, SenPo, Wong, Chun-Yuen, Chan, Leanne L. H., Ho, Johnny C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5457386/
https://www.ncbi.nlm.nih.gov/pubmed/28582967
http://dx.doi.org/10.1186/s11671-017-2156-z

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5457386/
https://www.ncbi.nlm.nih.gov/pubmed/28582967
http://dx.doi.org/10.1186/s11671-017-2156-z

Ejemplares similares