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Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS

In this study, the influence of direct current (DC) biasing on the growth of titanium dioxide (TiO(2)) layers and their nucleation behavior has been investigated. Titania films were prepared by plasma enhanced atomic layer deposition (PEALD) using Ti(OiPr)(4) as metal organic precursor. Oxygen plasm...

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Detalles Bibliográficos
Autores principales:	Ratzsch, Stephan, Kley, Ernst-Bernhard, Tünnermann, Andreas, Szeghalmi, Adriana
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2015
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5458875/ https://www.ncbi.nlm.nih.gov/pubmed/28793679 http://dx.doi.org/10.3390/ma8115425

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