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High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
We investigated the electrical and optoelectronic properties of a magnesium zinc oxide thin-film phototransistor. We fabricate an ultraviolet phototransistor by using a wide-bandgap MgZnO thin film as the active layer material of the thin film transistor (TFT). The fabricated device demonstrated a t...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459180/ https://www.ncbi.nlm.nih.gov/pubmed/28772487 http://dx.doi.org/10.3390/ma10020126 |
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author | Li, Jyun-Yi Chang, Sheng-Po Hsu, Ming-Hung Chang, Shoou-Jinn |
author_facet | Li, Jyun-Yi Chang, Sheng-Po Hsu, Ming-Hung Chang, Shoou-Jinn |
author_sort | Li, Jyun-Yi |
collection | PubMed |
description | We investigated the electrical and optoelectronic properties of a magnesium zinc oxide thin-film phototransistor. We fabricate an ultraviolet phototransistor by using a wide-bandgap MgZnO thin film as the active layer material of the thin film transistor (TFT). The fabricated device demonstrated a threshold voltage of 3.1 V, on–off current ratio of 10(5), subthreshold swing of 0.8 V/decade, and mobility of 5 cm(2)/V·s in a dark environment. As a UV photodetector, the responsivity of the device was 3.12 A/W, and the rejection ratio was 6.55 × 10(5) at a gate bias of −5 V under 290 nm illumination. |
format | Online Article Text |
id | pubmed-5459180 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-54591802017-07-28 High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering Li, Jyun-Yi Chang, Sheng-Po Hsu, Ming-Hung Chang, Shoou-Jinn Materials (Basel) Article We investigated the electrical and optoelectronic properties of a magnesium zinc oxide thin-film phototransistor. We fabricate an ultraviolet phototransistor by using a wide-bandgap MgZnO thin film as the active layer material of the thin film transistor (TFT). The fabricated device demonstrated a threshold voltage of 3.1 V, on–off current ratio of 10(5), subthreshold swing of 0.8 V/decade, and mobility of 5 cm(2)/V·s in a dark environment. As a UV photodetector, the responsivity of the device was 3.12 A/W, and the rejection ratio was 6.55 × 10(5) at a gate bias of −5 V under 290 nm illumination. MDPI 2017-02-04 /pmc/articles/PMC5459180/ /pubmed/28772487 http://dx.doi.org/10.3390/ma10020126 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Li, Jyun-Yi Chang, Sheng-Po Hsu, Ming-Hung Chang, Shoou-Jinn High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering |
title | High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering |
title_full | High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering |
title_fullStr | High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering |
title_full_unstemmed | High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering |
title_short | High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering |
title_sort | high responsivity mgzno ultraviolet thin-film phototransistor developed using radio frequency sputtering |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459180/ https://www.ncbi.nlm.nih.gov/pubmed/28772487 http://dx.doi.org/10.3390/ma10020126 |
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