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High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering

We investigated the electrical and optoelectronic properties of a magnesium zinc oxide thin-film phototransistor. We fabricate an ultraviolet phototransistor by using a wide-bandgap MgZnO thin film as the active layer material of the thin film transistor (TFT). The fabricated device demonstrated a t...

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Detalles Bibliográficos
Autores principales: Li, Jyun-Yi, Chang, Sheng-Po, Hsu, Ming-Hung, Chang, Shoou-Jinn
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459180/
https://www.ncbi.nlm.nih.gov/pubmed/28772487
http://dx.doi.org/10.3390/ma10020126
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author Li, Jyun-Yi
Chang, Sheng-Po
Hsu, Ming-Hung
Chang, Shoou-Jinn
author_facet Li, Jyun-Yi
Chang, Sheng-Po
Hsu, Ming-Hung
Chang, Shoou-Jinn
author_sort Li, Jyun-Yi
collection PubMed
description We investigated the electrical and optoelectronic properties of a magnesium zinc oxide thin-film phototransistor. We fabricate an ultraviolet phototransistor by using a wide-bandgap MgZnO thin film as the active layer material of the thin film transistor (TFT). The fabricated device demonstrated a threshold voltage of 3.1 V, on–off current ratio of 10(5), subthreshold swing of 0.8 V/decade, and mobility of 5 cm(2)/V·s in a dark environment. As a UV photodetector, the responsivity of the device was 3.12 A/W, and the rejection ratio was 6.55 × 10(5) at a gate bias of −5 V under 290 nm illumination.
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spelling pubmed-54591802017-07-28 High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering Li, Jyun-Yi Chang, Sheng-Po Hsu, Ming-Hung Chang, Shoou-Jinn Materials (Basel) Article We investigated the electrical and optoelectronic properties of a magnesium zinc oxide thin-film phototransistor. We fabricate an ultraviolet phototransistor by using a wide-bandgap MgZnO thin film as the active layer material of the thin film transistor (TFT). The fabricated device demonstrated a threshold voltage of 3.1 V, on–off current ratio of 10(5), subthreshold swing of 0.8 V/decade, and mobility of 5 cm(2)/V·s in a dark environment. As a UV photodetector, the responsivity of the device was 3.12 A/W, and the rejection ratio was 6.55 × 10(5) at a gate bias of −5 V under 290 nm illumination. MDPI 2017-02-04 /pmc/articles/PMC5459180/ /pubmed/28772487 http://dx.doi.org/10.3390/ma10020126 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Li, Jyun-Yi
Chang, Sheng-Po
Hsu, Ming-Hung
Chang, Shoou-Jinn
High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
title High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
title_full High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
title_fullStr High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
title_full_unstemmed High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
title_short High Responsivity MgZnO Ultraviolet Thin-Film Phototransistor Developed Using Radio Frequency Sputtering
title_sort high responsivity mgzno ultraviolet thin-film phototransistor developed using radio frequency sputtering
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459180/
https://www.ncbi.nlm.nih.gov/pubmed/28772487
http://dx.doi.org/10.3390/ma10020126
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