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A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices
Patterning micro-structures on highly hydrophobic surface by photolithography is usually inevitable for fabricating devices based on electrowetting effects. The key challenges for such photolithography processes are how to coat photoresist uniformly and maintain the hydrophobicity of the highly hydr...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2017
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5479844/ https://www.ncbi.nlm.nih.gov/pubmed/28638145 http://dx.doi.org/10.1038/s41598-017-04342-z |