Cargando…
A modified squeeze equation for predicting the filling ratio of nanoimprint lithography
A numerical method using the modified squeeze model is proposed in this paper in order to overcome the limitation of the established squeeze equation and obtain filling ratios for nanoimprint lithography (NIL). Because the imprinting velocity is overestimated when the ratio of indenter width to poly...
Autores principales: | Ryu, JiHyeong, Lee, Ho, Lee, Sang-Ho, Lim, HyungJun, Lee, JaeJong |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer Singapore
2017
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5487822/ https://www.ncbi.nlm.nih.gov/pubmed/28680797 http://dx.doi.org/10.1186/s40580-017-0108-z |
Ejemplares similares
-
Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process
por: Ha, Yeonjoo, et al.
Publicado: (2022) -
Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios
por: Yin, Minqi, et al.
Publicado: (2018) -
UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
por: Thanner, Christine, et al.
Publicado: (2021) -
Nanoimprint lithography for nanodevice fabrication
por: Barcelo, Steven, et al.
Publicado: (2016) -
A review of roll-to-roll nanoimprint lithography
por: Kooy, Nazrin, et al.
Publicado: (2014)