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Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode

We establish a powerful poly(4-styrenesulfonate) (PSS)-treated strategy for sulfur vacancy healing in monolayer MoS(2) to precisely and steadily tune its electronic state. The self-healing mechanism, in which the sulfur vacancies are healed spontaneously by the sulfur adatom clusters on the MoS(2) s...

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Autores principales: Zhang, Xiankun, Liao, Qingliang, Liu, Shuo, Kang, Zhuo, Zhang, Zheng, Du, Junli, Li, Feng, Zhang, Shuhao, Xiao, Jiankun, Liu, Baishan, Ou, Yang, Liu, Xiaozhi, Gu, Lin, Zhang, Yue
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5489680/
https://www.ncbi.nlm.nih.gov/pubmed/28639620
http://dx.doi.org/10.1038/ncomms15881
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author Zhang, Xiankun
Liao, Qingliang
Liu, Shuo
Kang, Zhuo
Zhang, Zheng
Du, Junli
Li, Feng
Zhang, Shuhao
Xiao, Jiankun
Liu, Baishan
Ou, Yang
Liu, Xiaozhi
Gu, Lin
Zhang, Yue
author_facet Zhang, Xiankun
Liao, Qingliang
Liu, Shuo
Kang, Zhuo
Zhang, Zheng
Du, Junli
Li, Feng
Zhang, Shuhao
Xiao, Jiankun
Liu, Baishan
Ou, Yang
Liu, Xiaozhi
Gu, Lin
Zhang, Yue
author_sort Zhang, Xiankun
collection PubMed
description We establish a powerful poly(4-styrenesulfonate) (PSS)-treated strategy for sulfur vacancy healing in monolayer MoS(2) to precisely and steadily tune its electronic state. The self-healing mechanism, in which the sulfur vacancies are healed spontaneously by the sulfur adatom clusters on the MoS(2) surface through a PSS-induced hydrogenation process, is proposed and demonstrated systematically. The electron concentration of the self-healed MoS(2) dramatically decreased by 643 times, leading to a work function enhancement of ∼150 meV. This strategy is employed to fabricate a high performance lateral monolayer MoS(2) homojunction which presents a perfect rectifying behaviour, excellent photoresponsivity of ∼308 mA W(−1) and outstanding air-stability after two months. Unlike previous chemical doping, the lattice defect-induced local fields are eliminated during the process of the sulfur vacancy self-healing to largely improve the homojunction performance. Our findings demonstrate a promising and facile strategy in 2D material electronic state modulation for the development of next-generation electronics and optoelectronics.
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spelling pubmed-54896802017-07-06 Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode Zhang, Xiankun Liao, Qingliang Liu, Shuo Kang, Zhuo Zhang, Zheng Du, Junli Li, Feng Zhang, Shuhao Xiao, Jiankun Liu, Baishan Ou, Yang Liu, Xiaozhi Gu, Lin Zhang, Yue Nat Commun Article We establish a powerful poly(4-styrenesulfonate) (PSS)-treated strategy for sulfur vacancy healing in monolayer MoS(2) to precisely and steadily tune its electronic state. The self-healing mechanism, in which the sulfur vacancies are healed spontaneously by the sulfur adatom clusters on the MoS(2) surface through a PSS-induced hydrogenation process, is proposed and demonstrated systematically. The electron concentration of the self-healed MoS(2) dramatically decreased by 643 times, leading to a work function enhancement of ∼150 meV. This strategy is employed to fabricate a high performance lateral monolayer MoS(2) homojunction which presents a perfect rectifying behaviour, excellent photoresponsivity of ∼308 mA W(−1) and outstanding air-stability after two months. Unlike previous chemical doping, the lattice defect-induced local fields are eliminated during the process of the sulfur vacancy self-healing to largely improve the homojunction performance. Our findings demonstrate a promising and facile strategy in 2D material electronic state modulation for the development of next-generation electronics and optoelectronics. Nature Publishing Group 2017-06-22 /pmc/articles/PMC5489680/ /pubmed/28639620 http://dx.doi.org/10.1038/ncomms15881 Text en Copyright © 2017, The Author(s) http://creativecommons.org/licenses/by/4.0/ Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Zhang, Xiankun
Liao, Qingliang
Liu, Shuo
Kang, Zhuo
Zhang, Zheng
Du, Junli
Li, Feng
Zhang, Shuhao
Xiao, Jiankun
Liu, Baishan
Ou, Yang
Liu, Xiaozhi
Gu, Lin
Zhang, Yue
Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode
title Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode
title_full Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode
title_fullStr Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode
title_full_unstemmed Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode
title_short Poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS(2) homojunction photodiode
title_sort poly(4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer mos(2) homojunction photodiode
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5489680/
https://www.ncbi.nlm.nih.gov/pubmed/28639620
http://dx.doi.org/10.1038/ncomms15881
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