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Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation
The ability to engineer the thermal conductivity of materials allows us to control the flow of heat and derive novel functionalities such as thermal rectification, thermal switching and thermal cloaking. While this could be achieved by making use of composites and metamaterials at bulk length-scales...
Autores principales: | , , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5490267/ https://www.ncbi.nlm.nih.gov/pubmed/28653663 http://dx.doi.org/10.1038/ncomms15919 |
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author | Zhao, Yunshan Liu, Dan Chen, Jie Zhu, Liyan Belianinov, Alex Ovchinnikova, Olga S. Unocic, Raymond R. Burch, Matthew J. Kim, Songkil Hao, Hanfang Pickard, Daniel S. Li, Baowen Thong, John T. L. |
author_facet | Zhao, Yunshan Liu, Dan Chen, Jie Zhu, Liyan Belianinov, Alex Ovchinnikova, Olga S. Unocic, Raymond R. Burch, Matthew J. Kim, Songkil Hao, Hanfang Pickard, Daniel S. Li, Baowen Thong, John T. L. |
author_sort | Zhao, Yunshan |
collection | PubMed |
description | The ability to engineer the thermal conductivity of materials allows us to control the flow of heat and derive novel functionalities such as thermal rectification, thermal switching and thermal cloaking. While this could be achieved by making use of composites and metamaterials at bulk length-scales, engineering the thermal conductivity at micro- and nano-scale dimensions is considerably more challenging. In this work, we show that the local thermal conductivity along a single Si nanowire can be tuned to a desired value (between crystalline and amorphous limits) with high spatial resolution through selective helium ion irradiation with a well-controlled dose. The underlying mechanism is understood through molecular dynamics simulations and quantitative phonon-defect scattering rate analysis, where the behaviour of thermal conductivity with dose is attributed to the accumulation and agglomeration of scattering centres at lower doses. Beyond a threshold dose, a crystalline-amorphous transition was observed. |
format | Online Article Text |
id | pubmed-5490267 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-54902672017-07-06 Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation Zhao, Yunshan Liu, Dan Chen, Jie Zhu, Liyan Belianinov, Alex Ovchinnikova, Olga S. Unocic, Raymond R. Burch, Matthew J. Kim, Songkil Hao, Hanfang Pickard, Daniel S. Li, Baowen Thong, John T. L. Nat Commun Article The ability to engineer the thermal conductivity of materials allows us to control the flow of heat and derive novel functionalities such as thermal rectification, thermal switching and thermal cloaking. While this could be achieved by making use of composites and metamaterials at bulk length-scales, engineering the thermal conductivity at micro- and nano-scale dimensions is considerably more challenging. In this work, we show that the local thermal conductivity along a single Si nanowire can be tuned to a desired value (between crystalline and amorphous limits) with high spatial resolution through selective helium ion irradiation with a well-controlled dose. The underlying mechanism is understood through molecular dynamics simulations and quantitative phonon-defect scattering rate analysis, where the behaviour of thermal conductivity with dose is attributed to the accumulation and agglomeration of scattering centres at lower doses. Beyond a threshold dose, a crystalline-amorphous transition was observed. Nature Publishing Group 2017-06-27 /pmc/articles/PMC5490267/ /pubmed/28653663 http://dx.doi.org/10.1038/ncomms15919 Text en Copyright © 2017, The Author(s) http://creativecommons.org/licenses/by/4.0/ Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Zhao, Yunshan Liu, Dan Chen, Jie Zhu, Liyan Belianinov, Alex Ovchinnikova, Olga S. Unocic, Raymond R. Burch, Matthew J. Kim, Songkil Hao, Hanfang Pickard, Daniel S. Li, Baowen Thong, John T. L. Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
title | Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
title_full | Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
title_fullStr | Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
title_full_unstemmed | Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
title_short | Engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
title_sort | engineering the thermal conductivity along an individual silicon nanowire by selective helium ion irradiation |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5490267/ https://www.ncbi.nlm.nih.gov/pubmed/28653663 http://dx.doi.org/10.1038/ncomms15919 |
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