Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds

We set out to study the use of a series of ruthenocenes as possible and promising sources for ruthenium and/or ruthenium oxide film formation.The thermal stability of a series of ruthenocenes, including (η(5)-C(5)H(4)R)(η(5)-C(5)H(4)R´)Ru (1), R = R´ = H (3), R = H, R´ = CH(2)NMe(2) (5), R = H, R´= C(O)Me (6), R = R´ = C(O)Me (7), R = H, R´ = C(O)(CH(2))(3)CO(2)H (8), R = H, R´ = C(O)(CH(2))(2)CO(2)H (9), R = H, R´ = C(O)(CH(2))(3)CO(2)Me (10), R = H, R´= C(O)(CH(2))(2)CO(2)Me (11), R = R´ = SiMe(3)), (η(5)-C(4)H(3)O-2,4-Me(2))(2)Ru (2), and (η(5)-C(5)H(5)-2,4-Me(2))(2)Ru (4) was studied by thermogravimetry. From these studies, it could be concluded that 1–4, 6 and 9–11 are the most thermally stable molecules. The sublimation pressure of these sandwich compounds was measured using a Knudsen cell. Among these, the compound 11 shows the highest vapor pressure.