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Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma
Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides or hormones. While the beneficial effects of...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5514119/ https://www.ncbi.nlm.nih.gov/pubmed/28717249 http://dx.doi.org/10.1038/s41598-017-04963-4 |
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author | Wang, Xing-Quan Zhou, Ren-Wu Groot, Gerard de Bazaka, Kateryna Murphy, Anthony B. Ostrikov, Kostya (Ken) |
author_facet | Wang, Xing-Quan Zhou, Ren-Wu Groot, Gerard de Bazaka, Kateryna Murphy, Anthony B. Ostrikov, Kostya (Ken) |
author_sort | Wang, Xing-Quan |
collection | PubMed |
description | Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides or hormones. While the beneficial effects of plasma treatment on seed germination, disease resistance and agricultural output have been reported, the mechanisms that underpin the observed biological responses are yet to be fully described. This study employs Fourier Transform Infrared (FTIR) spectroscopy and emission spectroscopy to capture chemical interactions between plasmas and seed surfaces with the aim to provide a more comprehensive account of plasma−seed interactions. FTIR spectroscopy of the seed surface confirms plasma-induced chemical etching of the surface. The etching facilitates permeation of water into the seed, which is confirmed by water uptake measurements. FTIR of exhaust and emission spectra of discharges show oxygen-containing species known for their ability to stimulate biochemical processes and deactivate pathogenic microorganisms. In addition, water gas, CO(2), CO and molecules containing −C(CH(3))(3)− moieties observed in FTIR spectra of the exhaust gas during plasma treatment may be partly responsible for the plasma chemical etching of seed surface through oxidizing the organic components of the seed coat. |
format | Online Article Text |
id | pubmed-5514119 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-55141192017-07-19 Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma Wang, Xing-Quan Zhou, Ren-Wu Groot, Gerard de Bazaka, Kateryna Murphy, Anthony B. Ostrikov, Kostya (Ken) Sci Rep Article Cold atmospheric plasma has recently emerged as a simple, low-cost and efficient physical method for inducing significant biological responses in seeds and plants without the use of traditional, potentially environmentally-hazardous chemicals, fungicides or hormones. While the beneficial effects of plasma treatment on seed germination, disease resistance and agricultural output have been reported, the mechanisms that underpin the observed biological responses are yet to be fully described. This study employs Fourier Transform Infrared (FTIR) spectroscopy and emission spectroscopy to capture chemical interactions between plasmas and seed surfaces with the aim to provide a more comprehensive account of plasma−seed interactions. FTIR spectroscopy of the seed surface confirms plasma-induced chemical etching of the surface. The etching facilitates permeation of water into the seed, which is confirmed by water uptake measurements. FTIR of exhaust and emission spectra of discharges show oxygen-containing species known for their ability to stimulate biochemical processes and deactivate pathogenic microorganisms. In addition, water gas, CO(2), CO and molecules containing −C(CH(3))(3)− moieties observed in FTIR spectra of the exhaust gas during plasma treatment may be partly responsible for the plasma chemical etching of seed surface through oxidizing the organic components of the seed coat. Nature Publishing Group UK 2017-07-17 /pmc/articles/PMC5514119/ /pubmed/28717249 http://dx.doi.org/10.1038/s41598-017-04963-4 Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Wang, Xing-Quan Zhou, Ren-Wu Groot, Gerard de Bazaka, Kateryna Murphy, Anthony B. Ostrikov, Kostya (Ken) Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
title | Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
title_full | Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
title_fullStr | Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
title_full_unstemmed | Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
title_short | Spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
title_sort | spectral characteristics of cotton seeds treated by a dielectric barrier discharge plasma |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5514119/ https://www.ncbi.nlm.nih.gov/pubmed/28717249 http://dx.doi.org/10.1038/s41598-017-04963-4 |
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