Cargando…

A Nanojunction Polymer Photoelectrode for Efficient Charge Transport and Separation

A metal‐free photoanode nanojunction architecture, composed of B‐doped carbon nitride nanolayer and bulk carbon nitride, was fabricated by a one‐step approach. This type of nanojunction (s‐BCN) overcomes a few intrinsic drawbacks of carbon nitride film (severe bulk charge recombination and slow char...

Descripción completa

Detalles Bibliográficos
Autores principales: Ruan, Qiushi, Luo, Wenjun, Xie, Jijia, Wang, Yiou, Liu, Xu, Bai, Zhiming, Carmalt, Claire J., Tang, Junwang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5519949/
https://www.ncbi.nlm.nih.gov/pubmed/28520233
http://dx.doi.org/10.1002/anie.201703372
Descripción
Sumario:A metal‐free photoanode nanojunction architecture, composed of B‐doped carbon nitride nanolayer and bulk carbon nitride, was fabricated by a one‐step approach. This type of nanojunction (s‐BCN) overcomes a few intrinsic drawbacks of carbon nitride film (severe bulk charge recombination and slow charge transfer). The top layer of the nanojunction has a depth of ca. 100 nm and the bottom layer is ca. 900 nm. The nanojunction photoanode results into a 10‐fold higher photocurrent than bulk graphitic carbon nitride (G‐CN) photoanode, with a record photocurrent density of 103.2 μA cm(−2) at 1.23 V vs. RHE under one sun irradiation and an extremely high incident photon‐to‐current efficiency (IPCE) of ca. 10 % at 400 nm. Electrochemical impedance spectroscopy, Mott–Schottky plots, and intensity‐modulated photocurrent spectroscopy show that such enhancement is mainly due to the mitigated deep trap states, a more than 10 times faster charge transfer rate and nearly three times higher conductivity due to the nanojunction architecture.