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Study of Radio Frequency Plasma Treatment of PVDF Film Using Ar, O(2) and (Ar + O(2)) Gases for Improved Polypyrrole Adhesion

Improvement of the binding of polypyrrole with PVDF (polyvinylidene fluoride) thin film using low pressure plasma was studied. The effects of various plasma gases i.e., Ar, O(2) and Ar + O(2) gases on surface roughness, surface chemistry and hydrophilicity were noted. The topographical change of the...

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Detalles Bibliográficos
Autores principales: Kaynak, Akif, Mehmood, Tariq, Dai, Xiujuan J., Magniez, Kevin, Kouzani, Abbas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2013
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5521317/
https://www.ncbi.nlm.nih.gov/pubmed/28811447
http://dx.doi.org/10.3390/ma6083482
Descripción
Sumario:Improvement of the binding of polypyrrole with PVDF (polyvinylidene fluoride) thin film using low pressure plasma was studied. The effects of various plasma gases i.e., Ar, O(2) and Ar + O(2) gases on surface roughness, surface chemistry and hydrophilicity were noted. The topographical change of the PVDF film was observed by means of scanning electron microscopy and chemical changes by X-ray photoelectron spectroscopy, with adhesion of polypyrrole (PPy) by abrasion tests and sheet resistance measurements. Results showed that the increase in roughness and surface functionalization by oxygen functional groups contributed to improved adhesion and Ar + O(2) plasma gave better adhesion.