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Study of Radio Frequency Plasma Treatment of PVDF Film Using Ar, O(2) and (Ar + O(2)) Gases for Improved Polypyrrole Adhesion
Improvement of the binding of polypyrrole with PVDF (polyvinylidene fluoride) thin film using low pressure plasma was studied. The effects of various plasma gases i.e., Ar, O(2) and Ar + O(2) gases on surface roughness, surface chemistry and hydrophilicity were noted. The topographical change of the...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2013
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5521317/ https://www.ncbi.nlm.nih.gov/pubmed/28811447 http://dx.doi.org/10.3390/ma6083482 |
Sumario: | Improvement of the binding of polypyrrole with PVDF (polyvinylidene fluoride) thin film using low pressure plasma was studied. The effects of various plasma gases i.e., Ar, O(2) and Ar + O(2) gases on surface roughness, surface chemistry and hydrophilicity were noted. The topographical change of the PVDF film was observed by means of scanning electron microscopy and chemical changes by X-ray photoelectron spectroscopy, with adhesion of polypyrrole (PPy) by abrasion tests and sheet resistance measurements. Results showed that the increase in roughness and surface functionalization by oxygen functional groups contributed to improved adhesion and Ar + O(2) plasma gave better adhesion. |
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