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An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator

Nanoscale materials have properties that frequently differ from those of their bulk form due to the scale effect, and therefore a measurement technique that can take account of such material characteristics with high accuracy and sensitivity is required. In the present study, advanced nanomechanical...

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Autor principal: Kim, Yun Young
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5551849/
https://www.ncbi.nlm.nih.gov/pubmed/28773165
http://dx.doi.org/10.3390/ma10070806
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author Kim, Yun Young
author_facet Kim, Yun Young
author_sort Kim, Yun Young
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description Nanoscale materials have properties that frequently differ from those of their bulk form due to the scale effect, and therefore a measurement technique that can take account of such material characteristics with high accuracy and sensitivity is required. In the present study, advanced nanomechanical metrology was developed for evaluation of elastic properties of thin-film materials. A 52 nm thick chromium (Cr) film was deposited on a high-speed micromechanical resonator using an e-beam evaporator, and the structure was excited to resonate using an ultrasonic platform. The resonant frequencies for the first and second flexural vibration modes were measured using laser interferometry, and they were compared to analytical estimation from the classical beam theory. Results show that the experimental data are in excellent agreement with the theory, within 1% of the relative error, and a mass sensitivity up to 10.5 Hz/fg was achieved. Thus, the scale effect that reduced the Young’s modulus of Cr by 49.8% compared to its bulk property was correctly recognized by the proposed method.
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spelling pubmed-55518492017-08-11 An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator Kim, Yun Young Materials (Basel) Article Nanoscale materials have properties that frequently differ from those of their bulk form due to the scale effect, and therefore a measurement technique that can take account of such material characteristics with high accuracy and sensitivity is required. In the present study, advanced nanomechanical metrology was developed for evaluation of elastic properties of thin-film materials. A 52 nm thick chromium (Cr) film was deposited on a high-speed micromechanical resonator using an e-beam evaporator, and the structure was excited to resonate using an ultrasonic platform. The resonant frequencies for the first and second flexural vibration modes were measured using laser interferometry, and they were compared to analytical estimation from the classical beam theory. Results show that the experimental data are in excellent agreement with the theory, within 1% of the relative error, and a mass sensitivity up to 10.5 Hz/fg was achieved. Thus, the scale effect that reduced the Young’s modulus of Cr by 49.8% compared to its bulk property was correctly recognized by the proposed method. MDPI 2017-07-15 /pmc/articles/PMC5551849/ /pubmed/28773165 http://dx.doi.org/10.3390/ma10070806 Text en © 2017 by the author. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Kim, Yun Young
An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator
title An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator
title_full An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator
title_fullStr An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator
title_full_unstemmed An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator
title_short An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator
title_sort advanced characterization method for the elastic modulus of nanoscale thin-films using a high-frequency micromechanical resonator
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5551849/
https://www.ncbi.nlm.nih.gov/pubmed/28773165
http://dx.doi.org/10.3390/ma10070806
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