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On mechanism behind UV-A light enhanced antibacterial activity of gallic acid and propyl gallate against Escherichia coli O157:H7

Possible mechanisms behind the enhanced antimicrobial activity of gallic acid (GA) and its ester propyl gallate (PG) in the presence of UV-A light against Escherichia coli O157:H7 were investigated. GA by itself is a mild antimicrobial and has a pro-oxidant ability. We found that the presence of UV-...

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Detalles Bibliográficos
Autores principales: Wang, Qingyang, de Oliveira, Erick Falcao, Alborzi, Solmaz, Bastarrachea, Luis J., Tikekar, Rohan V.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5559599/
https://www.ncbi.nlm.nih.gov/pubmed/28814799
http://dx.doi.org/10.1038/s41598-017-08449-1
Descripción
Sumario:Possible mechanisms behind the enhanced antimicrobial activity of gallic acid (GA) and its ester propyl gallate (PG) in the presence of UV-A light against Escherichia coli O157:H7 were investigated. GA by itself is a mild antimicrobial and has a pro-oxidant ability. We found that the presence of UV-A light increases the uptake of GA by the bacteria. Once GA is internalized, the interaction between GA and UV-A induces intracellular ROS formation, leading to oxidative damage. Concurrently, GA + UV-A also inhibits the activity of superoxide dismutase (SOD), magnifying the imbalance of redox status of E. coli O157:H7. In addition to ROS induced damage, UV-A light and GA also cause injury to the cell membrane of E. coli O157:H7. UV-A exposed PG caused oxidative damage to the cell and significantly higher damage to the cell membrane than GA + UV-A treatment, explaining its higher effectiveness than GA + UV-A treatment. The findings presented here may be useful in developing new antimicrobial sanitation technologies for food and pharmaceutical industries.