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Tailoring Heterovalent Interface Formation with Light

Integrating different semiconductor materials into an epitaxial device structure offers additional degrees of freedom to select for optimal material properties in each layer. However, interfaces between materials with different valences (i.e. III-V, II-VI and IV semiconductors) can be difficult to f...

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Detalles Bibliográficos
Autores principales: Park, Kwangwook, Alberi, Kirstin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5561236/
https://www.ncbi.nlm.nih.gov/pubmed/28819295
http://dx.doi.org/10.1038/s41598-017-07670-2