Manipulating the adhesion of electroless nickel-phosphorus film on silicon wafers by silane compound modification and rapid thermal annealing

In this study, the effect of 3-2-(2-aminoethylamino) ethylamino propyl trimethoxysilane (ETAS) modification and post rapid thermal annealing (RTA) treatment on the adhesion of electroless plated nickel-phosphorus (ELP Ni-P) film on polyvinyl alcohol-capped palladium nanoclusters (PVA-Pd) catalyzed s...

Descripción completa

Detalles Bibliográficos
Autores principales: Hsu, Chin-Wei, Wang, Wei-Yen, Wang, Kuan-Ting, Chen, Hou-An, Wei, Tzu-Chien
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5574985/
https://www.ncbi.nlm.nih.gov/pubmed/28851883
http://dx.doi.org/10.1038/s41598-017-08639-x

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5574985/
https://www.ncbi.nlm.nih.gov/pubmed/28851883
http://dx.doi.org/10.1038/s41598-017-08639-x

Ejemplares similares