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Tunable electroresistance and electro-optic effects of transparent molecular ferroelectrics

Recent progress in molecular ferroelectrics (MOFEs) has been overshadowed by the lack of high-quality thin films for device integration. We report a water-based air-processable technique to prepare large-area MOFE thin films, controlled by supersaturation growth at the liquid-air interface under a t...

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Detalles Bibliográficos
Autores principales: Zhang, Zhuolei, Li, Peng-Fei, Tang, Yuan-Yuan, Wilson, Andrew J., Willets, Katherine, Wuttig, Manfred, Xiong, Ren-Gen, Ren, Shenqiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5576882/
https://www.ncbi.nlm.nih.gov/pubmed/28875167
http://dx.doi.org/10.1126/sciadv.1701008
Descripción
Sumario:Recent progress in molecular ferroelectrics (MOFEs) has been overshadowed by the lack of high-quality thin films for device integration. We report a water-based air-processable technique to prepare large-area MOFE thin films, controlled by supersaturation growth at the liquid-air interface under a temperature gradient and external water partial pressure. We used this technique to fabricate ImClO(4) thin films and found a large, tunable room temperature electroresistance: a 20-fold resistance variation upon polarization switching. The as-grown films are transparent and consist of a bamboo-like structure of (2, [Formula: see text] ,0) and (1,0, [Formula: see text]) structural variants of R3m symmetry with a reversible polarization of 6.7 μC/cm(2). The resulting ferroelectric domain structure leads to a reversible electromechanical response of d(33) = 38.8 pm/V. Polarization switching results in a change of the refractive index, n, of single domains, [Formula: see text]. The remarkable combination of these characteristics renders MOFEs a prime candidate material for new nanoelectronic devices. The information that we present in this work will open a new area of MOFE thin-film technologies.