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Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells
In this work, nickel thin films were deposited on texture silicon by electroless plated deposition. The electroless-deposited Ni layers were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDS), X-ray diffraction anal...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5578308/ https://www.ncbi.nlm.nih.gov/pubmed/28805724 http://dx.doi.org/10.3390/ma10080942 |
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author | Hsieh, Shu Huei Hsieh, Jhong Min Chen, Wen Jauh Chuang, Chia Chih |
author_facet | Hsieh, Shu Huei Hsieh, Jhong Min Chen, Wen Jauh Chuang, Chia Chih |
author_sort | Hsieh, Shu Huei |
collection | PubMed |
description | In this work, nickel thin films were deposited on texture silicon by electroless plated deposition. The electroless-deposited Ni layers were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDS), X-ray diffraction analysis (XRD), and sheet resistance measurement. The results indicate that the dominant phase was Ni(2)Si and NiSi in samples annealed at 300–800 °C. Sheet resistance values were found to correlate well with the surface morphology obtained by SEM and the results of XRD diffraction. The Cu/Ni contact system was used to fabricate solar cells by using two different activating baths. The open circuit voltage (Voc) of the Cu/Ni samples, before and after annealing, was measured under air mass (AM) 1.5 conditions to determine solar cell properties. The results show that open circuit voltage of a solar cell can be enhanced when the activation solution incorporated hydrofluoric acid (HF). This is mainly attributed to the native silicon oxide layer that can be decreased and/or removed by HF with the corresponding reduction of series resistance. |
format | Online Article Text |
id | pubmed-5578308 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-55783082017-09-05 Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells Hsieh, Shu Huei Hsieh, Jhong Min Chen, Wen Jauh Chuang, Chia Chih Materials (Basel) Article In this work, nickel thin films were deposited on texture silicon by electroless plated deposition. The electroless-deposited Ni layers were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDS), X-ray diffraction analysis (XRD), and sheet resistance measurement. The results indicate that the dominant phase was Ni(2)Si and NiSi in samples annealed at 300–800 °C. Sheet resistance values were found to correlate well with the surface morphology obtained by SEM and the results of XRD diffraction. The Cu/Ni contact system was used to fabricate solar cells by using two different activating baths. The open circuit voltage (Voc) of the Cu/Ni samples, before and after annealing, was measured under air mass (AM) 1.5 conditions to determine solar cell properties. The results show that open circuit voltage of a solar cell can be enhanced when the activation solution incorporated hydrofluoric acid (HF). This is mainly attributed to the native silicon oxide layer that can be decreased and/or removed by HF with the corresponding reduction of series resistance. MDPI 2017-08-14 /pmc/articles/PMC5578308/ /pubmed/28805724 http://dx.doi.org/10.3390/ma10080942 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Hsieh, Shu Huei Hsieh, Jhong Min Chen, Wen Jauh Chuang, Chia Chih Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells |
title | Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells |
title_full | Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells |
title_fullStr | Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells |
title_full_unstemmed | Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells |
title_short | Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells |
title_sort | electroless nickel deposition for front side metallization of silicon solar cells |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5578308/ https://www.ncbi.nlm.nih.gov/pubmed/28805724 http://dx.doi.org/10.3390/ma10080942 |
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