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Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures
Production of semiconductor nanostructures with high yield and tight control of shape and size distribution is an immediate quest in diverse areas of science and technology. Electroless wet chemical etching or stain etching can produce semiconductor nanoparticles with high yield but is limited to a...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5587652/ https://www.ncbi.nlm.nih.gov/pubmed/28878317 http://dx.doi.org/10.1038/s41598-017-10751-x |
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author | Beke, David Károlyházy, Gyula Czigány, Zsolt Bortel, Gábor Kamarás, Katalin Gali, Adam |
author_facet | Beke, David Károlyházy, Gyula Czigány, Zsolt Bortel, Gábor Kamarás, Katalin Gali, Adam |
author_sort | Beke, David |
collection | PubMed |
description | Production of semiconductor nanostructures with high yield and tight control of shape and size distribution is an immediate quest in diverse areas of science and technology. Electroless wet chemical etching or stain etching can produce semiconductor nanoparticles with high yield but is limited to a few materials because of the lack of understanding the physical-chemical processes behind. Here we report a no-photon exciton generation chemistry (NPEGEC) process, playing a key role in stain etching of semiconductors. We demonstrate NPEGEC on silicon carbide polymorphs as model materials. Specifically, size control of cubic silicon carbide nanoparticles of diameter below ten nanometers was achieved by engineering hexagonal inclusions in microcrystalline cubic silicon carbide. Our finding provides a recipe to engineer patterned semiconductor nanostructures for a broad class of materials. |
format | Online Article Text |
id | pubmed-5587652 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-55876522017-09-13 Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures Beke, David Károlyházy, Gyula Czigány, Zsolt Bortel, Gábor Kamarás, Katalin Gali, Adam Sci Rep Article Production of semiconductor nanostructures with high yield and tight control of shape and size distribution is an immediate quest in diverse areas of science and technology. Electroless wet chemical etching or stain etching can produce semiconductor nanoparticles with high yield but is limited to a few materials because of the lack of understanding the physical-chemical processes behind. Here we report a no-photon exciton generation chemistry (NPEGEC) process, playing a key role in stain etching of semiconductors. We demonstrate NPEGEC on silicon carbide polymorphs as model materials. Specifically, size control of cubic silicon carbide nanoparticles of diameter below ten nanometers was achieved by engineering hexagonal inclusions in microcrystalline cubic silicon carbide. Our finding provides a recipe to engineer patterned semiconductor nanostructures for a broad class of materials. Nature Publishing Group UK 2017-09-06 /pmc/articles/PMC5587652/ /pubmed/28878317 http://dx.doi.org/10.1038/s41598-017-10751-x Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Beke, David Károlyházy, Gyula Czigány, Zsolt Bortel, Gábor Kamarás, Katalin Gali, Adam Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
title | Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
title_full | Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
title_fullStr | Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
title_full_unstemmed | Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
title_short | Harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
title_sort | harnessing no-photon exciton generation chemistry to engineer semiconductor nanostructures |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5587652/ https://www.ncbi.nlm.nih.gov/pubmed/28878317 http://dx.doi.org/10.1038/s41598-017-10751-x |
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