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Memory characteristics of silicon nanowire transistors generated by weak impact ionization
In this study, we demonstrate the static random access memory (SRAM) characteristics generated by weak impact ionization in bendable field-effect transistors (FETs) with n(+)-p-n(+) silicon nanowire (SiNW) channels. Our bendable SiNW FETs show not only superior switching characteristics such as an o...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5622113/ https://www.ncbi.nlm.nih.gov/pubmed/28963456 http://dx.doi.org/10.1038/s41598-017-12347-x |
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author | Lim, Doohyeok Kim, Minsuk Kim, Yoonjoong Kim, Sangsig |
author_facet | Lim, Doohyeok Kim, Minsuk Kim, Yoonjoong Kim, Sangsig |
author_sort | Lim, Doohyeok |
collection | PubMed |
description | In this study, we demonstrate the static random access memory (SRAM) characteristics generated by weak impact ionization in bendable field-effect transistors (FETs) with n(+)-p-n(+) silicon nanowire (SiNW) channels. Our bendable SiNW FETs show not only superior switching characteristics such as an on/off current ratio of ~10(5) and steep subthreshold swing (~5 mV/dec) but also reliable SRAM characteristics. The SRAM characteristics originate from the positive feedback loops in the SiNW FETs generated by weak impact ionization. This paper describes in detail the operating mechanism of our device and demonstrates the potential of bendable SiNW FETs for future SRAM applications. |
format | Online Article Text |
id | pubmed-5622113 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-56221132017-10-12 Memory characteristics of silicon nanowire transistors generated by weak impact ionization Lim, Doohyeok Kim, Minsuk Kim, Yoonjoong Kim, Sangsig Sci Rep Article In this study, we demonstrate the static random access memory (SRAM) characteristics generated by weak impact ionization in bendable field-effect transistors (FETs) with n(+)-p-n(+) silicon nanowire (SiNW) channels. Our bendable SiNW FETs show not only superior switching characteristics such as an on/off current ratio of ~10(5) and steep subthreshold swing (~5 mV/dec) but also reliable SRAM characteristics. The SRAM characteristics originate from the positive feedback loops in the SiNW FETs generated by weak impact ionization. This paper describes in detail the operating mechanism of our device and demonstrates the potential of bendable SiNW FETs for future SRAM applications. Nature Publishing Group UK 2017-09-29 /pmc/articles/PMC5622113/ /pubmed/28963456 http://dx.doi.org/10.1038/s41598-017-12347-x Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Lim, Doohyeok Kim, Minsuk Kim, Yoonjoong Kim, Sangsig Memory characteristics of silicon nanowire transistors generated by weak impact ionization |
title | Memory characteristics of silicon nanowire transistors generated by weak impact ionization |
title_full | Memory characteristics of silicon nanowire transistors generated by weak impact ionization |
title_fullStr | Memory characteristics of silicon nanowire transistors generated by weak impact ionization |
title_full_unstemmed | Memory characteristics of silicon nanowire transistors generated by weak impact ionization |
title_short | Memory characteristics of silicon nanowire transistors generated by weak impact ionization |
title_sort | memory characteristics of silicon nanowire transistors generated by weak impact ionization |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5622113/ https://www.ncbi.nlm.nih.gov/pubmed/28963456 http://dx.doi.org/10.1038/s41598-017-12347-x |
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