Cargando…
Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources
Time-resolved two-dimensional (2D) profiles of electron density (n (e)) and electron temperature (T (e)) of extreme ultraviolet (EUV) lithography light source plasmas were obtained from the ion components of collective Thomson scattering (CTS) spectra. The highest EUV conversion efficiency (CE) of 4...
Autores principales: | Tomita, Kentaro, Sato, Yuta, Tsukiyama, Syouichi, Eguchi, Toshiaki, Uchino, Kiichiro, Kouge, Kouichiro, Tomuro, Hiroaki, Yanagida, Tatsuya, Wada, Yasunori, Kunishima, Masahito, Soumagne, Georg, Kodama, Takeshi, Mizoguchi, Hakaru, Sunahara, Atsushi, Nishihara, Katsunobu |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5624956/ https://www.ncbi.nlm.nih.gov/pubmed/28970565 http://dx.doi.org/10.1038/s41598-017-11685-0 |
Ejemplares similares
-
Observation of plasma inflows in laser-produced Sn plasma and their contribution to extreme-ultraviolet light output enhancement
por: Tomita, Kentaro, et al.
Publicado: (2023) -
Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
por: Tarrio, Charles, et al.
Publicado: (2003) -
Chemically Amplified
Molecular Glass Photoresist Regulated
by 2-Aminoanthracene Additive for Electron Beam Lithography
and Extreme Ultraviolet Lithography
por: Zhang, Siliang, et al.
Publicado: (2023) -
Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist
por: Zhou, Zai-Fa, et al.
Publicado: (2018) -
Ultraviolet Laser Lithography of Titania Photonic Crystals for Terahertz-Wave Modulation
por: Kirihara, Soshu, et al.
Publicado: (2018)