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Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold
Visible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)(3)](2+) and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. This approach to radical generation has proven useful for the synthesis...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Beilstein-Institut
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5629420/ https://www.ncbi.nlm.nih.gov/pubmed/29046834 http://dx.doi.org/10.3762/bjnano.8.187 |
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author | Quarels, Rashanique D Zhai, Xianglin Kuruppu, Neepa Hedlund, Jenny K Ellsworth, Ashley A Walker, Amy V Garno, Jayne C Ragains, Justin R |
author_facet | Quarels, Rashanique D Zhai, Xianglin Kuruppu, Neepa Hedlund, Jenny K Ellsworth, Ashley A Walker, Amy V Garno, Jayne C Ragains, Justin R |
author_sort | Quarels, Rashanique D |
collection | PubMed |
description | Visible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)(3)](2+) and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. This approach to radical generation has proven useful for the synthesis of small organic molecules. Herein, we demonstrate for the first time the visible-light photosensitized deposition of robust alkyl thin films on Au surfaces using phthalimide esters as the alkyl radical precursors. In particular, we combine visible-light photosensitization with particle lithography to produce nanostructured thin films, the thickness of which can be measured easily using AFM cursor profiles. Analysis with AFM demonstrated that the films are robust and resistant to mechanical force while contact angle goniometry suggests a multilayered and disordered film structure. Analysis with IRRAS, XPS, and TOF SIMS provides further insights. |
format | Online Article Text |
id | pubmed-5629420 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Beilstein-Institut |
record_format | MEDLINE/PubMed |
spelling | pubmed-56294202017-10-18 Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold Quarels, Rashanique D Zhai, Xianglin Kuruppu, Neepa Hedlund, Jenny K Ellsworth, Ashley A Walker, Amy V Garno, Jayne C Ragains, Justin R Beilstein J Nanotechnol Full Research Paper Visible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)(3)](2+) and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. This approach to radical generation has proven useful for the synthesis of small organic molecules. Herein, we demonstrate for the first time the visible-light photosensitized deposition of robust alkyl thin films on Au surfaces using phthalimide esters as the alkyl radical precursors. In particular, we combine visible-light photosensitization with particle lithography to produce nanostructured thin films, the thickness of which can be measured easily using AFM cursor profiles. Analysis with AFM demonstrated that the films are robust and resistant to mechanical force while contact angle goniometry suggests a multilayered and disordered film structure. Analysis with IRRAS, XPS, and TOF SIMS provides further insights. Beilstein-Institut 2017-09-06 /pmc/articles/PMC5629420/ /pubmed/29046834 http://dx.doi.org/10.3762/bjnano.8.187 Text en Copyright © 2017, Quarels et al. https://creativecommons.org/licenses/by/4.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms) |
spellingShingle | Full Research Paper Quarels, Rashanique D Zhai, Xianglin Kuruppu, Neepa Hedlund, Jenny K Ellsworth, Ashley A Walker, Amy V Garno, Jayne C Ragains, Justin R Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
title | Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
title_full | Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
title_fullStr | Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
title_full_unstemmed | Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
title_short | Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
title_sort | application of visible-light photosensitization to form alkyl-radical-derived thin films on gold |
topic | Full Research Paper |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5629420/ https://www.ncbi.nlm.nih.gov/pubmed/29046834 http://dx.doi.org/10.3762/bjnano.8.187 |
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