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Angstrom-scale flatness using selective nanoscale etching

The realization of flat surfaces on the angstrom scale is required in advanced devices to avoid loss due to carrier (electron and/or photon) scattering. In this work, we have developed a new surface flattening method that involves near-field etching, where optical near-fields (ONFs) act to dissociat...

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Detalles Bibliográficos
Autores principales: Yatsui, Takashi, Saito, Hiroshi, Nobusada, Katsuyuki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5669236/
https://www.ncbi.nlm.nih.gov/pubmed/29114444
http://dx.doi.org/10.3762/bjnano.8.217