Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography

We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al(2)O(3). Nanoscal...

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Detalles Bibliográficos
Autores principales: Kim, Hyojeong, Arbutina, Kristin, Xu, Anqin, Liu, Haitao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2017
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5687006/
https://www.ncbi.nlm.nih.gov/pubmed/29181293
http://dx.doi.org/10.3762/bjnano.8.236
Descripción
Sumario:We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al(2)O(3). Nanoscale features of the DNA nanostructures were preserved after the ALD coating and the patterns are resistive to UV/O(3) oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films.

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