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Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography
We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al(2)O(3). Nanoscal...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Beilstein-Institut
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5687006/ https://www.ncbi.nlm.nih.gov/pubmed/29181293 http://dx.doi.org/10.3762/bjnano.8.236 |
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author | Kim, Hyojeong Arbutina, Kristin Xu, Anqin Liu, Haitao |
author_facet | Kim, Hyojeong Arbutina, Kristin Xu, Anqin Liu, Haitao |
author_sort | Kim, Hyojeong |
collection | PubMed |
description | We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al(2)O(3). Nanoscale features of the DNA nanostructures were preserved after the ALD coating and the patterns are resistive to UV/O(3) oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films. |
format | Online Article Text |
id | pubmed-5687006 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Beilstein-Institut |
record_format | MEDLINE/PubMed |
spelling | pubmed-56870062017-11-27 Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography Kim, Hyojeong Arbutina, Kristin Xu, Anqin Liu, Haitao Beilstein J Nanotechnol Full Research Paper We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al(2)O(3). Nanoscale features of the DNA nanostructures were preserved after the ALD coating and the patterns are resistive to UV/O(3) oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films. Beilstein-Institut 2017-11-09 /pmc/articles/PMC5687006/ /pubmed/29181293 http://dx.doi.org/10.3762/bjnano.8.236 Text en Copyright © 2017, Kim et al. https://creativecommons.org/licenses/by/4.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms) |
spellingShingle | Full Research Paper Kim, Hyojeong Arbutina, Kristin Xu, Anqin Liu, Haitao Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography |
title | Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography |
title_full | Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography |
title_fullStr | Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography |
title_full_unstemmed | Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography |
title_short | Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography |
title_sort | increasing the stability of dna nanostructure templates by atomic layer deposition of al(2)o(3) and its application in imprinting lithography |
topic | Full Research Paper |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5687006/ https://www.ncbi.nlm.nih.gov/pubmed/29181293 http://dx.doi.org/10.3762/bjnano.8.236 |
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