Cargando…

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al(2)O(3) and its application in imprinting lithography

We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al(2)O(3). Nanoscal...

Descripción completa

Detalles Bibliográficos
Autores principales:	Kim, Hyojeong, Arbutina, Kristin, Xu, Anqin, Liu, Haitao
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Beilstein-Institut 2017
Materias:	Full Research Paper
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5687006/ https://www.ncbi.nlm.nih.gov/pubmed/29181293 http://dx.doi.org/10.3762/bjnano.8.236

Ejemplares similares

Atomic layer deposition of nanostructured materials
por: Pinna, Nicola, et al.
Publicado: (2012)

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching
por: Gonçalves, Manuel R, et al.
Publicado: (2011)

Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
por: Krýsová, Hana, et al.
Publicado: (2021)

Fabrication of buried nanostructures by atomic layer deposition
por: Ali, Rizwan, et al.
Publicado: (2018)

Nanocube Imprint Lithography
por: Agrawal, Harshal, et al.
Publicado: (2020)

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al(2)O(3)-films
por: Haeberle, Jörg, et al.
Publicado: (2013)

Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography
por: Kolhatkar, Gitanjali, et al.
Publicado: (2018)

Is atomic layer deposition of silver possible on N95 masks?
por: Hashemi Astaneh, Sarah, et al.
Publicado: (2022)

Evolution of microstructure and related optical properties of ZnO grown by atomic layer deposition
por: Abou Chaaya, Adib, et al.
Publicado: (2013)

Atomic layer deposition for efficient oxygen evolution reaction at Pt/Ir catalyst layers
por: Schlicht, Stefanie, et al.
Publicado: (2020)

Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography
por: Jiang, Youwei, et al.
Publicado: (2019)

Atomic layer deposition and properties of ZrO(2)/Fe(2)O(3) thin films
por: Kalam, Kristjan, et al.
Publicado: (2018)

Quantum size effects in TiO(2) thin films grown by atomic layer deposition
por: Tallarida, Massimo, et al.
Publicado: (2014)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process
por: Zhao, Kai, et al.
Publicado: (2022)

High-Temperature Atomic Layer Deposition of GaN on 1D Nanostructures
por: Austin, Aaron J., et al.
Publicado: (2020)

Improved Reproducibility of PbS Colloidal Quantum Dots Solar Cells Using Atomic Layer–Deposited TiO(2)
por: Sukharevska, Nataliia, et al.
Publicado: (2019)

3D Simulation of Nano-Imprint Lithography
por: Marín, Jose Manuel Román, et al.
Publicado: (2009)

Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition
por: Bang, Seokhwan, et al.
Publicado: (2012)

Characterization of Al Incorporation into HfO(2) Dielectric by Atomic Layer Deposition
por: Rahman, Md. Mamunur, et al.
Publicado: (2019)

Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
por: Yazdani, Nuri, et al.
Publicado: (2014)

Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition
por: Tamm, Aile, et al.
Publicado: (2021)

Surface Nanostructure Formation and Atomic-Scale Templates for Nanodevices
por: Cui, Xiaoyang, et al.
Publicado: (2018)

Effect of annealing treatments on CeO(2) grown on TiN and Si substrates by atomic layer deposition
por: Vangelista, Silvia, et al.
Publicado: (2018)

Formation of Micro- and Nanostructures on the Nanotitanium Surface by Chemical Etching and Deposition of Titania Films by Atomic Layer Deposition (ALD)
por: Nazarov, Denis V., et al.
Publicado: (2015)

AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
por: Kao, Wei-Chung, et al.
Publicado: (2019)

Chemically Stable Atomic-Layer-Deposited Al(2)O(3) Films for Processability
por: Broas, Mikael, et al.
Publicado: (2017)

Atomic Layer Deposition Al(2)O(3) Coatings Significantly Improve Thermal, Chemical, and Mechanical Stability of Anodic TiO(2) Nanotube Layers
por: Zazpe, Raul, et al.
Publicado: (2017)

Room-temperature bonding of Al(2)O(3) thin films deposited using atomic layer deposition
por: Takakura, Ryo, et al.
Publicado: (2023)

Antibacterial and Osteogenic Properties of Ag Nanoparticles and Ag/TiO(2) Nanostructures Prepared by Atomic Layer Deposition
por: Nazarov, Denis, et al.
Publicado: (2022)

Characteristics of atomic layer deposited Gd(2)O(3) on n-GaN with an AlN layer
por: Kim, Hogyoung, et al.
Publicado: (2018)

Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
por: Bugot, Cathy, et al.
Publicado: (2013)

Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
por: Ji, Sanghoon, et al.
Publicado: (2015)

Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor
por: Franz, Mathias, et al.
Publicado: (2023)

Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
por: Kalam, Kristjan, et al.
Publicado: (2023)

Particle atomic layer deposition
por: Weimer, Alan W.
Publicado: (2019)

Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application
por: Kaur, Parmish, et al.
Publicado: (2021)

Atomic Layer Deposition of Ternary Indium/Tin/Aluminum Oxide Thin Films, Their Characterization and Transistor Performance under Illumination.
por: Büschges, M. Isabelle, et al.
Publicado: (2021)

Pulse-Atomic Force Lithography: A Powerful Nanofabrication Technique to Fabricate Constant and Varying-Depth Nanostructures
por: Pellegrino, Paolo, et al.
Publicado: (2022)

Electrical properties and thermal stability in stack structure of HfO(2)/Al(2)O(3)/InSb by atomic layer deposition
por: Baik, Min, et al.
Publicado: (2017)

Cannot write session to /tmp/vufind_sessions/sess_uinipmlmg0ttlqd0du98lg1dms