Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications

In this paper, we discuss the use of broadband microwaves (MW) to characterize the thermal stability of organic and hybrid silicon-organic thin films meant for insulation applications in micro- and nanoelectronic devices. We take advantage of MW propagation characteristics to extract and examine the...

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Detalles Bibliográficos
Autores principales: Sunday, Christopher E., Montgomery, Karl R., Amoah, Papa K., Obeng, Yaw S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5714312/
https://www.ncbi.nlm.nih.gov/pubmed/29214117
http://dx.doi.org/10.1149/2.0141709jss

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5714312/
https://www.ncbi.nlm.nih.gov/pubmed/29214117
http://dx.doi.org/10.1149/2.0141709jss

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