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Strain induced band inversion and topological phase transition in methyl-decorated stanene film
The researches for new quantum spin Hall (QSH) insulators with large bulk energy gap are of much significance for their practical applications at room temperature in electronic devices with low-energy consumption. By means of first-principles calculations, we proposed that methyl-decorated stanene (...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5719061/ https://www.ncbi.nlm.nih.gov/pubmed/29213076 http://dx.doi.org/10.1038/s41598-017-17336-8 |
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author | Wang, Dongchao Chen, Li Liu, Hongmei Shi, Changmin Wang, Xiaoli Cui, Guangliang Zhang, Pinhua Chen, Yeqing |
author_facet | Wang, Dongchao Chen, Li Liu, Hongmei Shi, Changmin Wang, Xiaoli Cui, Guangliang Zhang, Pinhua Chen, Yeqing |
author_sort | Wang, Dongchao |
collection | PubMed |
description | The researches for new quantum spin Hall (QSH) insulators with large bulk energy gap are of much significance for their practical applications at room temperature in electronic devices with low-energy consumption. By means of first-principles calculations, we proposed that methyl-decorated stanene (SnCH(3)) film can be tuned into QSH insulator under critical tensile strain of 6%. The nonzero topological invariant and helical edge states further confirm the nontrivial nature in stretched SnCH(3) film. The topological phase transition originates from the s-p (xy) type band inversion at the Γ point with the strain increased. The spin-orbital coupling (SOC) induces a large band gap of ~0.24 eV, indicating that SnCH(3) film under strain is a quite promising material to achieve QSH effect. The proper substrate, h-BN, finally is presented to support the SnCH(3) film with nontrivial topology preserved. |
format | Online Article Text |
id | pubmed-5719061 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-57190612017-12-08 Strain induced band inversion and topological phase transition in methyl-decorated stanene film Wang, Dongchao Chen, Li Liu, Hongmei Shi, Changmin Wang, Xiaoli Cui, Guangliang Zhang, Pinhua Chen, Yeqing Sci Rep Article The researches for new quantum spin Hall (QSH) insulators with large bulk energy gap are of much significance for their practical applications at room temperature in electronic devices with low-energy consumption. By means of first-principles calculations, we proposed that methyl-decorated stanene (SnCH(3)) film can be tuned into QSH insulator under critical tensile strain of 6%. The nonzero topological invariant and helical edge states further confirm the nontrivial nature in stretched SnCH(3) film. The topological phase transition originates from the s-p (xy) type band inversion at the Γ point with the strain increased. The spin-orbital coupling (SOC) induces a large band gap of ~0.24 eV, indicating that SnCH(3) film under strain is a quite promising material to achieve QSH effect. The proper substrate, h-BN, finally is presented to support the SnCH(3) film with nontrivial topology preserved. Nature Publishing Group UK 2017-12-06 /pmc/articles/PMC5719061/ /pubmed/29213076 http://dx.doi.org/10.1038/s41598-017-17336-8 Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Wang, Dongchao Chen, Li Liu, Hongmei Shi, Changmin Wang, Xiaoli Cui, Guangliang Zhang, Pinhua Chen, Yeqing Strain induced band inversion and topological phase transition in methyl-decorated stanene film |
title | Strain induced band inversion and topological phase transition in methyl-decorated stanene film |
title_full | Strain induced band inversion and topological phase transition in methyl-decorated stanene film |
title_fullStr | Strain induced band inversion and topological phase transition in methyl-decorated stanene film |
title_full_unstemmed | Strain induced band inversion and topological phase transition in methyl-decorated stanene film |
title_short | Strain induced band inversion and topological phase transition in methyl-decorated stanene film |
title_sort | strain induced band inversion and topological phase transition in methyl-decorated stanene film |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5719061/ https://www.ncbi.nlm.nih.gov/pubmed/29213076 http://dx.doi.org/10.1038/s41598-017-17336-8 |
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