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Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds

We developed a dual plasma desorption/ionization system using two plasmas for the semi-invasive analysis of compounds on heat-sensitive substrates such as skin. The first plasma was used for the desorption of the surface compounds, whereas the second was used for the ionization of the desorbed compo...

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Autores principales: Aida, Mari, Iwai, Takahiro, Okamoto, Yuki, Kohno, Satoshi, Kakegawa, Ken, Miyahara, Hidekazu, Seto, Yasuo, Okino, Akitoshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Mass Spectrometry Society of Japan 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5720943/
https://www.ncbi.nlm.nih.gov/pubmed/29234573
http://dx.doi.org/10.5702/massspectrometry.S0075
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author Aida, Mari
Iwai, Takahiro
Okamoto, Yuki
Kohno, Satoshi
Kakegawa, Ken
Miyahara, Hidekazu
Seto, Yasuo
Okino, Akitoshi
author_facet Aida, Mari
Iwai, Takahiro
Okamoto, Yuki
Kohno, Satoshi
Kakegawa, Ken
Miyahara, Hidekazu
Seto, Yasuo
Okino, Akitoshi
author_sort Aida, Mari
collection PubMed
description We developed a dual plasma desorption/ionization system using two plasmas for the semi-invasive analysis of compounds on heat-sensitive substrates such as skin. The first plasma was used for the desorption of the surface compounds, whereas the second was used for the ionization of the desorbed compounds. Using the two plasmas, each process can be optimized individually. A successful analysis of phenyl salicylate and 2-isopropylpyridine was achieved using the developed system. Furthermore, we showed that it was possible to detect the mass signals derived from a sample even at a distance 50 times greater than the distance from the position at which the samples were detached. In addition, to increase the intensity of the mass signal, 0%–0.02% (v/v) of hydrogen gas was added to the base gas generated in the ionizing plasma. We found that by optimizing the gas flow rate through the addition of a small amount of hydrogen gas, it was possible to obtain the intensity of the mass signal that was 45–824 times greater than that obtained without the addition of hydrogen gas.
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spelling pubmed-57209432017-12-12 Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds Aida, Mari Iwai, Takahiro Okamoto, Yuki Kohno, Satoshi Kakegawa, Ken Miyahara, Hidekazu Seto, Yasuo Okino, Akitoshi Mass Spectrom (Tokyo) Original Article We developed a dual plasma desorption/ionization system using two plasmas for the semi-invasive analysis of compounds on heat-sensitive substrates such as skin. The first plasma was used for the desorption of the surface compounds, whereas the second was used for the ionization of the desorbed compounds. Using the two plasmas, each process can be optimized individually. A successful analysis of phenyl salicylate and 2-isopropylpyridine was achieved using the developed system. Furthermore, we showed that it was possible to detect the mass signals derived from a sample even at a distance 50 times greater than the distance from the position at which the samples were detached. In addition, to increase the intensity of the mass signal, 0%–0.02% (v/v) of hydrogen gas was added to the base gas generated in the ionizing plasma. We found that by optimizing the gas flow rate through the addition of a small amount of hydrogen gas, it was possible to obtain the intensity of the mass signal that was 45–824 times greater than that obtained without the addition of hydrogen gas. The Mass Spectrometry Society of Japan 2017 2017-12-08 /pmc/articles/PMC5720943/ /pubmed/29234573 http://dx.doi.org/10.5702/massspectrometry.S0075 Text en Copyright © 2017 Mari Aida, Takahiro Iwai, Yuki Okamoto, Satoshi Kohno, Ken Kakegawa, Hidekazu Miyahara, Yasuo Seto, and Akitoshi Okino. http://creativecommons.org/licenses/by/2.5/ This is an open access article distributed under the terms of Creative Commons Attribution License, which permits use, distribution, and reproduction in any medium, provided the original work is properly cited and is not used for commercial purposes.
spellingShingle Original Article
Aida, Mari
Iwai, Takahiro
Okamoto, Yuki
Kohno, Satoshi
Kakegawa, Ken
Miyahara, Hidekazu
Seto, Yasuo
Okino, Akitoshi
Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds
title Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds
title_full Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds
title_fullStr Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds
title_full_unstemmed Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds
title_short Development of a Dual Plasma Desorption/Ionization System for the Noncontact and Highly Sensitive Analysis of Surface Adhesive Compounds
title_sort development of a dual plasma desorption/ionization system for the noncontact and highly sensitive analysis of surface adhesive compounds
topic Original Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5720943/
https://www.ncbi.nlm.nih.gov/pubmed/29234573
http://dx.doi.org/10.5702/massspectrometry.S0075
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