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Semiconductor SERS enhancement enabled by oxygen incorporation

Semiconductor-based surface-enhanced Raman spectroscopy (SERS) substrates represent a new frontier in the field of SERS. However, the application of semiconductor materials as SERS substrates is still seriously impeded by their low SERS enhancement and inferior detection sensitivity, especially for...

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Autores principales: Zheng, Zuhui, Cong, Shan, Gong, Wenbin, Xuan, Jinnan, Li, Guohui, Lu, Weibang, Geng, Fengxia, Zhao, Zhigang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5722866/
https://www.ncbi.nlm.nih.gov/pubmed/29222510
http://dx.doi.org/10.1038/s41467-017-02166-z
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author Zheng, Zuhui
Cong, Shan
Gong, Wenbin
Xuan, Jinnan
Li, Guohui
Lu, Weibang
Geng, Fengxia
Zhao, Zhigang
author_facet Zheng, Zuhui
Cong, Shan
Gong, Wenbin
Xuan, Jinnan
Li, Guohui
Lu, Weibang
Geng, Fengxia
Zhao, Zhigang
author_sort Zheng, Zuhui
collection PubMed
description Semiconductor-based surface-enhanced Raman spectroscopy (SERS) substrates represent a new frontier in the field of SERS. However, the application of semiconductor materials as SERS substrates is still seriously impeded by their low SERS enhancement and inferior detection sensitivity, especially for non-metal-oxide semiconductor materials. Herein, we demonstrate a general oxygen incorporation-assisted strategy to magnify the semiconductor substrate–analyte molecule interaction, leading to significant increase in SERS enhancement for non-metal-oxide semiconductor materials. Oxygen incorporation in MoS(2) even with trace concentrations can not only increase enhancement factors by up to 100,000-fold compared with oxygen-unincorporated samples but also endow MoS(2) with low limit of detection below 10(−7) M. Intriguingly, combined with the findings in previous studies, our present results indicate that both oxygen incorporation and extraction processes can result in SERS enhancement, probably due to the enhanced charge-transfer resonance as well as exciton resonance arising from the judicious control of oxygen admission in semiconductor substrate.
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spelling pubmed-57228662017-12-11 Semiconductor SERS enhancement enabled by oxygen incorporation Zheng, Zuhui Cong, Shan Gong, Wenbin Xuan, Jinnan Li, Guohui Lu, Weibang Geng, Fengxia Zhao, Zhigang Nat Commun Article Semiconductor-based surface-enhanced Raman spectroscopy (SERS) substrates represent a new frontier in the field of SERS. However, the application of semiconductor materials as SERS substrates is still seriously impeded by their low SERS enhancement and inferior detection sensitivity, especially for non-metal-oxide semiconductor materials. Herein, we demonstrate a general oxygen incorporation-assisted strategy to magnify the semiconductor substrate–analyte molecule interaction, leading to significant increase in SERS enhancement for non-metal-oxide semiconductor materials. Oxygen incorporation in MoS(2) even with trace concentrations can not only increase enhancement factors by up to 100,000-fold compared with oxygen-unincorporated samples but also endow MoS(2) with low limit of detection below 10(−7) M. Intriguingly, combined with the findings in previous studies, our present results indicate that both oxygen incorporation and extraction processes can result in SERS enhancement, probably due to the enhanced charge-transfer resonance as well as exciton resonance arising from the judicious control of oxygen admission in semiconductor substrate. Nature Publishing Group UK 2017-12-08 /pmc/articles/PMC5722866/ /pubmed/29222510 http://dx.doi.org/10.1038/s41467-017-02166-z Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Zheng, Zuhui
Cong, Shan
Gong, Wenbin
Xuan, Jinnan
Li, Guohui
Lu, Weibang
Geng, Fengxia
Zhao, Zhigang
Semiconductor SERS enhancement enabled by oxygen incorporation
title Semiconductor SERS enhancement enabled by oxygen incorporation
title_full Semiconductor SERS enhancement enabled by oxygen incorporation
title_fullStr Semiconductor SERS enhancement enabled by oxygen incorporation
title_full_unstemmed Semiconductor SERS enhancement enabled by oxygen incorporation
title_short Semiconductor SERS enhancement enabled by oxygen incorporation
title_sort semiconductor sers enhancement enabled by oxygen incorporation
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5722866/
https://www.ncbi.nlm.nih.gov/pubmed/29222510
http://dx.doi.org/10.1038/s41467-017-02166-z
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