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Coatings for FEL optics: preparation and characterization of B(4)C and Pt

Large X-ray mirrors are required for beam transport at both present-day and future free-electron lasers (FELs) and synchrotron sources worldwide. The demand for large mirrors with lengths up to 1 m single layers consisting of light or heavy elements has increased during the last few decades. Accordi...

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Autores principales: Störmer, Michael, Siewert, Frank, Horstmann, Christian, Buchheim, Jana, Gwalt, Grzegorz
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5741127/
https://www.ncbi.nlm.nih.gov/pubmed/29271760
http://dx.doi.org/10.1107/S1600577517016095
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author Störmer, Michael
Siewert, Frank
Horstmann, Christian
Buchheim, Jana
Gwalt, Grzegorz
author_facet Störmer, Michael
Siewert, Frank
Horstmann, Christian
Buchheim, Jana
Gwalt, Grzegorz
author_sort Störmer, Michael
collection PubMed
description Large X-ray mirrors are required for beam transport at both present-day and future free-electron lasers (FELs) and synchrotron sources worldwide. The demand for large mirrors with lengths up to 1 m single layers consisting of light or heavy elements has increased during the last few decades. Accordingly, surface finishing technology is now able to produce large substrate lengths with micro-roughness on the sub-nanometer scale. At the Helmholtz-Zentrum Geesthacht (HZG), a 4.5 m-long sputtering facility enables us to deposit a desired single-layer material some tens of nanometers thick. For the European XFEL project, the shape error should be less than 2 nm over the whole 1 m X-ray mirror length to ensure the safe and efficient delivery of X-ray beams to the scientific instruments. The challenge is to achieve thin-film deposition on silicon substrates, benders and gratings without any change in mirror shape. Thin films of boron carbide and platinum with a thickness in the range 30–100 nm were manufactured using the HZG sputtering facility. This setup is able to cover areas of up to 1500 mm × 120 mm in one step using rectangular sputtering sources. The coatings produced were characterized using various thin-film methods. It was possible to improve the coating process to achieve a very high uniformity of the layer thickness. The movement of the substrate in front of the sputtering source has been optimized. A variation in B(4)C layer thickness below 1 nm (peak-to-valley) was achieved at a mean thickness of 51.8 nm over a deposition length of 1.5 m. In the case of Pt, reflectometry and micro-roughness measurements were performed. The uniformity in layer thickness was about 1 nm (peak-to-valley). The micro-roughness of the Pt layers showed no significant change in the coated state for layer thicknesses of 32 nm and 102 nm compared with the uncoated substrate state. The experimental results achieved will be discussed with regard to current restrictions and future developments.
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spelling pubmed-57411272018-01-01 Coatings for FEL optics: preparation and characterization of B(4)C and Pt Störmer, Michael Siewert, Frank Horstmann, Christian Buchheim, Jana Gwalt, Grzegorz J Synchrotron Radiat Photondiag2017 Workshop Large X-ray mirrors are required for beam transport at both present-day and future free-electron lasers (FELs) and synchrotron sources worldwide. The demand for large mirrors with lengths up to 1 m single layers consisting of light or heavy elements has increased during the last few decades. Accordingly, surface finishing technology is now able to produce large substrate lengths with micro-roughness on the sub-nanometer scale. At the Helmholtz-Zentrum Geesthacht (HZG), a 4.5 m-long sputtering facility enables us to deposit a desired single-layer material some tens of nanometers thick. For the European XFEL project, the shape error should be less than 2 nm over the whole 1 m X-ray mirror length to ensure the safe and efficient delivery of X-ray beams to the scientific instruments. The challenge is to achieve thin-film deposition on silicon substrates, benders and gratings without any change in mirror shape. Thin films of boron carbide and platinum with a thickness in the range 30–100 nm were manufactured using the HZG sputtering facility. This setup is able to cover areas of up to 1500 mm × 120 mm in one step using rectangular sputtering sources. The coatings produced were characterized using various thin-film methods. It was possible to improve the coating process to achieve a very high uniformity of the layer thickness. The movement of the substrate in front of the sputtering source has been optimized. A variation in B(4)C layer thickness below 1 nm (peak-to-valley) was achieved at a mean thickness of 51.8 nm over a deposition length of 1.5 m. In the case of Pt, reflectometry and micro-roughness measurements were performed. The uniformity in layer thickness was about 1 nm (peak-to-valley). The micro-roughness of the Pt layers showed no significant change in the coated state for layer thicknesses of 32 nm and 102 nm compared with the uncoated substrate state. The experimental results achieved will be discussed with regard to current restrictions and future developments. International Union of Crystallography 2018-01-01 /pmc/articles/PMC5741127/ /pubmed/29271760 http://dx.doi.org/10.1107/S1600577517016095 Text en © Michael Störmer et al. 2018 http://creativecommons.org/licenses/by/2.0/uk/ This is an open-access article distributed under the terms of the Creative Commons Attribution (CC-BY) Licence, which permits unrestricted use, distribution, and reproduction in any medium, provided the original authors and source are cited.http://creativecommons.org/licenses/by/2.0/uk/
spellingShingle Photondiag2017 Workshop
Störmer, Michael
Siewert, Frank
Horstmann, Christian
Buchheim, Jana
Gwalt, Grzegorz
Coatings for FEL optics: preparation and characterization of B(4)C and Pt
title Coatings for FEL optics: preparation and characterization of B(4)C and Pt
title_full Coatings for FEL optics: preparation and characterization of B(4)C and Pt
title_fullStr Coatings for FEL optics: preparation and characterization of B(4)C and Pt
title_full_unstemmed Coatings for FEL optics: preparation and characterization of B(4)C and Pt
title_short Coatings for FEL optics: preparation and characterization of B(4)C and Pt
title_sort coatings for fel optics: preparation and characterization of b(4)c and pt
topic Photondiag2017 Workshop
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5741127/
https://www.ncbi.nlm.nih.gov/pubmed/29271760
http://dx.doi.org/10.1107/S1600577517016095
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