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Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH
The extreme-ultraviolet double-stage imaging Raman spectrometer is a permanent experimental endstation at the plane-grating monochromator beamline branch PG1 at FLASH at DESY in Hamburg, Germany. This unique instrument covers the photon energy range from 20 to 200 eV with high energy resolution of a...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
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International Union of Crystallography
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5741130/ https://www.ncbi.nlm.nih.gov/pubmed/29271763 http://dx.doi.org/10.1107/S1600577517013066 |
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author | Dziarzhytski, Siarhei Siewert, Frank Sokolov, Andrey Gwalt, Grzegorz Seliger, Tino Rübhausen, Michael Weigelt, Holger Brenner, Günter |
author_facet | Dziarzhytski, Siarhei Siewert, Frank Sokolov, Andrey Gwalt, Grzegorz Seliger, Tino Rübhausen, Michael Weigelt, Holger Brenner, Günter |
author_sort | Dziarzhytski, Siarhei |
collection | PubMed |
description | The extreme-ultraviolet double-stage imaging Raman spectrometer is a permanent experimental endstation at the plane-grating monochromator beamline branch PG1 at FLASH at DESY in Hamburg, Germany. This unique instrument covers the photon energy range from 20 to 200 eV with high energy resolution of about 2 to 20 meV (design values) featuring an efficient elastic line suppression as well as effective stray light rejection. Such a design enables studies of low-energy excitations like, for example, phonons in solids close to the vicinity of the elastic line. The Raman spectrometer effectively operates with four reflective off-axial parabolic mirrors and two plane-grating units. The optics quality and their precise alignment are crucial to guarantee best performance of the instrument. Here, results on a comprehensive investigation of the quality of the spectrometer diffraction gratings are presented. The gratings have been characterized by ex situ metrology at the BESSY-II Optics Laboratory, employing slope measuring deflectometry and interferometry as well as atomic force microscopy studies. The efficiency of these key optical elements has been measured at the at-wavelength metrology laboratory using the reflectometer at the BESSY-II Optics beamline. Also, the metrology results are discussed with respect to the expected resolving power of the instrument by including them in ray-tracing studies of the instrument. |
format | Online Article Text |
id | pubmed-5741130 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | International Union of Crystallography |
record_format | MEDLINE/PubMed |
spelling | pubmed-57411302018-01-01 Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH Dziarzhytski, Siarhei Siewert, Frank Sokolov, Andrey Gwalt, Grzegorz Seliger, Tino Rübhausen, Michael Weigelt, Holger Brenner, Günter J Synchrotron Radiat Photondiag2017 Workshop The extreme-ultraviolet double-stage imaging Raman spectrometer is a permanent experimental endstation at the plane-grating monochromator beamline branch PG1 at FLASH at DESY in Hamburg, Germany. This unique instrument covers the photon energy range from 20 to 200 eV with high energy resolution of about 2 to 20 meV (design values) featuring an efficient elastic line suppression as well as effective stray light rejection. Such a design enables studies of low-energy excitations like, for example, phonons in solids close to the vicinity of the elastic line. The Raman spectrometer effectively operates with four reflective off-axial parabolic mirrors and two plane-grating units. The optics quality and their precise alignment are crucial to guarantee best performance of the instrument. Here, results on a comprehensive investigation of the quality of the spectrometer diffraction gratings are presented. The gratings have been characterized by ex situ metrology at the BESSY-II Optics Laboratory, employing slope measuring deflectometry and interferometry as well as atomic force microscopy studies. The efficiency of these key optical elements has been measured at the at-wavelength metrology laboratory using the reflectometer at the BESSY-II Optics beamline. Also, the metrology results are discussed with respect to the expected resolving power of the instrument by including them in ray-tracing studies of the instrument. International Union of Crystallography 2018-01-01 /pmc/articles/PMC5741130/ /pubmed/29271763 http://dx.doi.org/10.1107/S1600577517013066 Text en © Siarhei Dziarzhytski et al. 2018 http://creativecommons.org/licenses/by/2.0/uk/ This is an open-access article distributed under the terms of the Creative Commons Attribution (CC-BY) Licence, which permits unrestricted use, distribution, and reproduction in any medium, provided the original authors and source are cited.http://creativecommons.org/licenses/by/2.0/uk/ |
spellingShingle | Photondiag2017 Workshop Dziarzhytski, Siarhei Siewert, Frank Sokolov, Andrey Gwalt, Grzegorz Seliger, Tino Rübhausen, Michael Weigelt, Holger Brenner, Günter Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH |
title | Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH |
title_full | Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH |
title_fullStr | Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH |
title_full_unstemmed | Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH |
title_short | Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH |
title_sort | diffraction gratings metrology and ray-tracing results for an xuv raman spectrometer at flash |
topic | Photondiag2017 Workshop |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5741130/ https://www.ncbi.nlm.nih.gov/pubmed/29271763 http://dx.doi.org/10.1107/S1600577517013066 |
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