Cargando…
A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (P(MgO)) and its thickness (t(MgO)), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA...
Autores principales: | , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2018
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5775398/ https://www.ncbi.nlm.nih.gov/pubmed/29352244 http://dx.doi.org/10.1038/s41598-018-19656-9 |
_version_ | 1783293898399940608 |
---|---|
author | Gweon, Hyung Keun Yun, Seok Jin Lim, Sang Ho |
author_facet | Gweon, Hyung Keun Yun, Seok Jin Lim, Sang Ho |
author_sort | Gweon, Hyung Keun |
collection | PubMed |
description | The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (P(MgO)) and its thickness (t(MgO)), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA is achieved at small values of P(MgO) and t(MgO), where the oxygen interpenetration into Co is expected to be small. The range of oxygen interpenetration is relatively extended in such a way that it affects both the Pt/Co and Co/MgO interfaces. The PMA properties of as-deposited samples are improved by post-annealing for temperatures up to 400 °C examined in this study, probably due to the diffusion of the interpenetrated oxygen atoms toward the Co/MgO interface. In a structure of Pt/Co (0.6 nm)/MgO (2 nm), which is fabricated at P(MgO) = 50 W and then annealed at 400 °C, a huge saturation field is achieved (over 40 kOe) indicating a very strong PMA. Between the two interfaces of Pt/Co and Co/MgO, the PMA is mainly due to the former in the as-deposited state, but the contribution of the latter increases with the increase in the annealing temperature. |
format | Online Article Text |
id | pubmed-5775398 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-57753982018-01-31 A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness Gweon, Hyung Keun Yun, Seok Jin Lim, Sang Ho Sci Rep Article The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (P(MgO)) and its thickness (t(MgO)), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA is achieved at small values of P(MgO) and t(MgO), where the oxygen interpenetration into Co is expected to be small. The range of oxygen interpenetration is relatively extended in such a way that it affects both the Pt/Co and Co/MgO interfaces. The PMA properties of as-deposited samples are improved by post-annealing for temperatures up to 400 °C examined in this study, probably due to the diffusion of the interpenetrated oxygen atoms toward the Co/MgO interface. In a structure of Pt/Co (0.6 nm)/MgO (2 nm), which is fabricated at P(MgO) = 50 W and then annealed at 400 °C, a huge saturation field is achieved (over 40 kOe) indicating a very strong PMA. Between the two interfaces of Pt/Co and Co/MgO, the PMA is mainly due to the former in the as-deposited state, but the contribution of the latter increases with the increase in the annealing temperature. Nature Publishing Group UK 2018-01-19 /pmc/articles/PMC5775398/ /pubmed/29352244 http://dx.doi.org/10.1038/s41598-018-19656-9 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Gweon, Hyung Keun Yun, Seok Jin Lim, Sang Ho A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness |
title | A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness |
title_full | A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness |
title_fullStr | A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness |
title_full_unstemmed | A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness |
title_short | A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness |
title_sort | very large perpendicular magnetic anisotropy in pt/co/mgo trilayers fabricated by controlling the mgo sputtering power and its thickness |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5775398/ https://www.ncbi.nlm.nih.gov/pubmed/29352244 http://dx.doi.org/10.1038/s41598-018-19656-9 |
work_keys_str_mv | AT gweonhyungkeun averylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness AT yunseokjin averylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness AT limsangho averylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness AT gweonhyungkeun verylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness AT yunseokjin verylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness AT limsangho verylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness |