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A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness

The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (P(MgO)) and its thickness (t(MgO)), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA...

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Autores principales: Gweon, Hyung Keun, Yun, Seok Jin, Lim, Sang Ho
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5775398/
https://www.ncbi.nlm.nih.gov/pubmed/29352244
http://dx.doi.org/10.1038/s41598-018-19656-9
_version_ 1783293898399940608
author Gweon, Hyung Keun
Yun, Seok Jin
Lim, Sang Ho
author_facet Gweon, Hyung Keun
Yun, Seok Jin
Lim, Sang Ho
author_sort Gweon, Hyung Keun
collection PubMed
description The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (P(MgO)) and its thickness (t(MgO)), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA is achieved at small values of P(MgO) and t(MgO), where the oxygen interpenetration into Co is expected to be small. The range of oxygen interpenetration is relatively extended in such a way that it affects both the Pt/Co and Co/MgO interfaces. The PMA properties of as-deposited samples are improved by post-annealing for temperatures up to 400 °C examined in this study, probably due to the diffusion of the interpenetrated oxygen atoms toward the Co/MgO interface. In a structure of Pt/Co (0.6 nm)/MgO (2 nm), which is fabricated at P(MgO) = 50 W and then annealed at 400 °C, a huge saturation field is achieved (over 40 kOe) indicating a very strong PMA. Between the two interfaces of Pt/Co and Co/MgO, the PMA is mainly due to the former in the as-deposited state, but the contribution of the latter increases with the increase in the annealing temperature.
format Online
Article
Text
id pubmed-5775398
institution National Center for Biotechnology Information
language English
publishDate 2018
publisher Nature Publishing Group UK
record_format MEDLINE/PubMed
spelling pubmed-57753982018-01-31 A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness Gweon, Hyung Keun Yun, Seok Jin Lim, Sang Ho Sci Rep Article The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (P(MgO)) and its thickness (t(MgO)), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA is achieved at small values of P(MgO) and t(MgO), where the oxygen interpenetration into Co is expected to be small. The range of oxygen interpenetration is relatively extended in such a way that it affects both the Pt/Co and Co/MgO interfaces. The PMA properties of as-deposited samples are improved by post-annealing for temperatures up to 400 °C examined in this study, probably due to the diffusion of the interpenetrated oxygen atoms toward the Co/MgO interface. In a structure of Pt/Co (0.6 nm)/MgO (2 nm), which is fabricated at P(MgO) = 50 W and then annealed at 400 °C, a huge saturation field is achieved (over 40 kOe) indicating a very strong PMA. Between the two interfaces of Pt/Co and Co/MgO, the PMA is mainly due to the former in the as-deposited state, but the contribution of the latter increases with the increase in the annealing temperature. Nature Publishing Group UK 2018-01-19 /pmc/articles/PMC5775398/ /pubmed/29352244 http://dx.doi.org/10.1038/s41598-018-19656-9 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Gweon, Hyung Keun
Yun, Seok Jin
Lim, Sang Ho
A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
title A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
title_full A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
title_fullStr A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
title_full_unstemmed A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
title_short A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness
title_sort very large perpendicular magnetic anisotropy in pt/co/mgo trilayers fabricated by controlling the mgo sputtering power and its thickness
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5775398/
https://www.ncbi.nlm.nih.gov/pubmed/29352244
http://dx.doi.org/10.1038/s41598-018-19656-9
work_keys_str_mv AT gweonhyungkeun averylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness
AT yunseokjin averylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness
AT limsangho averylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness
AT gweonhyungkeun verylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness
AT yunseokjin verylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness
AT limsangho verylargeperpendicularmagneticanisotropyinptcomgotrilayersfabricatedbycontrollingthemgosputteringpoweranditsthickness