Cargando…
Atomic layer deposition and properties of ZrO(2)/Fe(2)O(3) thin films
Thin solid films consisting of ZrO(2) and Fe(2)O(3) were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO(2) were stabilized by Fe(2)O(3) doping. The number of alternating ZrO(2) and Fe(2)O(3) deposition cycles were varied in order to achieve films with different cation rat...
Autores principales: | Kalam, Kristjan, Seemen, Helina, Ritslaid, Peeter, Rähn, Mihkel, Tamm, Aile, Kukli, Kaupo, Kasikov, Aarne, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena, García, Héctor |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Beilstein-Institut
2018
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5789441/ https://www.ncbi.nlm.nih.gov/pubmed/29441257 http://dx.doi.org/10.3762/bjnano.9.14 |
Ejemplares similares
-
Magnetic and Electrical Performance of Atomic Layer
Deposited Iron Erbium Oxide Thin Films
por: Tamm, Aile, et al.
Publicado: (2017) -
Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
por: Kalam, Kristjan, et al.
Publicado: (2023) -
Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition
por: Kalam, Kristjan, et al.
Publicado: (2022) -
Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition
por: Kukli, Kaupo, et al.
Publicado: (2022) -
Nanostructures Stacked on Hafnium Oxide Films Interfacing Graphene and Silicon Oxide Layers as Resistive Switching Media
por: Kahro, Tauno, et al.
Publicado: (2023)