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Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5859102/ https://www.ncbi.nlm.nih.gov/pubmed/29556097 http://dx.doi.org/10.1038/s41598-018-23156-1 |
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author | Zallo, Eugenio Cecchi, Stefano Boschker, Jos E. Mio, Antonio M. Arciprete, Fabrizio Privitera, Stefania Calarco, Raffaella |
author_facet | Zallo, Eugenio Cecchi, Stefano Boschker, Jos E. Mio, Antonio M. Arciprete, Fabrizio Privitera, Stefania Calarco, Raffaella |
author_sort | Zallo, Eugenio |
collection | PubMed |
description | |
format | Online Article Text |
id | pubmed-5859102 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-58591022018-03-20 Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys Zallo, Eugenio Cecchi, Stefano Boschker, Jos E. Mio, Antonio M. Arciprete, Fabrizio Privitera, Stefania Calarco, Raffaella Sci Rep Author Correction Nature Publishing Group UK 2018-03-19 /pmc/articles/PMC5859102/ /pubmed/29556097 http://dx.doi.org/10.1038/s41598-018-23156-1 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Author Correction Zallo, Eugenio Cecchi, Stefano Boschker, Jos E. Mio, Antonio M. Arciprete, Fabrizio Privitera, Stefania Calarco, Raffaella Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys |
title | Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys |
title_full | Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys |
title_fullStr | Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys |
title_full_unstemmed | Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys |
title_short | Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys |
title_sort | author correction: modulation of van der waals and classical epitaxy induced by strain at the si step edges in gesbte alloys |
topic | Author Correction |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5859102/ https://www.ncbi.nlm.nih.gov/pubmed/29556097 http://dx.doi.org/10.1038/s41598-018-23156-1 |
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