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Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys

Detalles Bibliográficos
Autores principales: Zallo, Eugenio, Cecchi, Stefano, Boschker, Jos E., Mio, Antonio M., Arciprete, Fabrizio, Privitera, Stefania, Calarco, Raffaella
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5859102/
https://www.ncbi.nlm.nih.gov/pubmed/29556097
http://dx.doi.org/10.1038/s41598-018-23156-1
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author Zallo, Eugenio
Cecchi, Stefano
Boschker, Jos E.
Mio, Antonio M.
Arciprete, Fabrizio
Privitera, Stefania
Calarco, Raffaella
author_facet Zallo, Eugenio
Cecchi, Stefano
Boschker, Jos E.
Mio, Antonio M.
Arciprete, Fabrizio
Privitera, Stefania
Calarco, Raffaella
author_sort Zallo, Eugenio
collection PubMed
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spelling pubmed-58591022018-03-20 Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys Zallo, Eugenio Cecchi, Stefano Boschker, Jos E. Mio, Antonio M. Arciprete, Fabrizio Privitera, Stefania Calarco, Raffaella Sci Rep Author Correction Nature Publishing Group UK 2018-03-19 /pmc/articles/PMC5859102/ /pubmed/29556097 http://dx.doi.org/10.1038/s41598-018-23156-1 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Author Correction
Zallo, Eugenio
Cecchi, Stefano
Boschker, Jos E.
Mio, Antonio M.
Arciprete, Fabrizio
Privitera, Stefania
Calarco, Raffaella
Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
title Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
title_full Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
title_fullStr Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
title_full_unstemmed Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
title_short Author Correction: Modulation of van der Waals and classical epitaxy induced by strain at the Si step edges in GeSbTe alloys
title_sort author correction: modulation of van der waals and classical epitaxy induced by strain at the si step edges in gesbte alloys
topic Author Correction
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5859102/
https://www.ncbi.nlm.nih.gov/pubmed/29556097
http://dx.doi.org/10.1038/s41598-018-23156-1
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