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Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide
In this paper, we investigate the synthesis of WSe(2) by chemical vapor deposition and study the current transport and device scaling of monolayer WSe(2). We found that the device characteristics of the back-gated WSe(2) transistors with thick oxides are very sensitive to the applied drain bias, esp...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
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Nature Publishing Group UK
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5869716/ https://www.ncbi.nlm.nih.gov/pubmed/29588469 http://dx.doi.org/10.1038/s41598-018-23501-4 |
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author | Yao, Zihan Liu, Jialun Xu, Kai Chow, Edmond K. C. Zhu, Wenjuan |
author_facet | Yao, Zihan Liu, Jialun Xu, Kai Chow, Edmond K. C. Zhu, Wenjuan |
author_sort | Yao, Zihan |
collection | PubMed |
description | In this paper, we investigate the synthesis of WSe(2) by chemical vapor deposition and study the current transport and device scaling of monolayer WSe(2). We found that the device characteristics of the back-gated WSe(2) transistors with thick oxides are very sensitive to the applied drain bias, especially for transistors in the sub-micrometer regime. The threshold voltage, subthreshold swing, and extracted field-effect mobility vary with the applied drain bias. The output characteristics in the long-channel transistors show ohmic-like behavior, while that in the short-channel transistors show Schottky-like behavior. Our investigation reveals that these phenomena are caused by the drain-induced barrier lowering (short-channel effect). For back-gated WSe(2) transistors with 280 nm oxide, the short-channel effect appears when the channel length is shorter than 0.4 µm. This extremely long electrostatic scaling length is due to the thick back-gate oxides. In addition, we also found that the hydrogen flow rate and the amount of WO(3) precursor play an important role in the morphology of the WSe(2). The hole mobility of the monolayer WSe(2) is limited by Columbic scattering below 250 K, while it is limited by phonon scattering above 250 K. These findings are very important for the synthesis of WSe(2) and accurate characterization of the electronic devices based on 2D materials. |
format | Online Article Text |
id | pubmed-5869716 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-58697162018-04-02 Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide Yao, Zihan Liu, Jialun Xu, Kai Chow, Edmond K. C. Zhu, Wenjuan Sci Rep Article In this paper, we investigate the synthesis of WSe(2) by chemical vapor deposition and study the current transport and device scaling of monolayer WSe(2). We found that the device characteristics of the back-gated WSe(2) transistors with thick oxides are very sensitive to the applied drain bias, especially for transistors in the sub-micrometer regime. The threshold voltage, subthreshold swing, and extracted field-effect mobility vary with the applied drain bias. The output characteristics in the long-channel transistors show ohmic-like behavior, while that in the short-channel transistors show Schottky-like behavior. Our investigation reveals that these phenomena are caused by the drain-induced barrier lowering (short-channel effect). For back-gated WSe(2) transistors with 280 nm oxide, the short-channel effect appears when the channel length is shorter than 0.4 µm. This extremely long electrostatic scaling length is due to the thick back-gate oxides. In addition, we also found that the hydrogen flow rate and the amount of WO(3) precursor play an important role in the morphology of the WSe(2). The hole mobility of the monolayer WSe(2) is limited by Columbic scattering below 250 K, while it is limited by phonon scattering above 250 K. These findings are very important for the synthesis of WSe(2) and accurate characterization of the electronic devices based on 2D materials. Nature Publishing Group UK 2018-03-27 /pmc/articles/PMC5869716/ /pubmed/29588469 http://dx.doi.org/10.1038/s41598-018-23501-4 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Yao, Zihan Liu, Jialun Xu, Kai Chow, Edmond K. C. Zhu, Wenjuan Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide |
title | Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide |
title_full | Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide |
title_fullStr | Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide |
title_full_unstemmed | Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide |
title_short | Material Synthesis and Device Aspects of Monolayer Tungsten Diselenide |
title_sort | material synthesis and device aspects of monolayer tungsten diselenide |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5869716/ https://www.ncbi.nlm.nih.gov/pubmed/29588469 http://dx.doi.org/10.1038/s41598-018-23501-4 |
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