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Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4)
The structural, mechanical, anisotropic, electronic, and thermal properties of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) in the tetragonal phase are systematically investigated in the present work. The mechanical stability is proved by the elastic constants of t-Si(3)N(4), t-Si(2)Ge...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5872976/ https://www.ncbi.nlm.nih.gov/pubmed/29518943 http://dx.doi.org/10.3390/ma11030397 |
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author | Han, Chenxi Chai, Changchun Fan, Qingyang Yang, Jionghao Yang, Yintang |
author_facet | Han, Chenxi Chai, Changchun Fan, Qingyang Yang, Jionghao Yang, Yintang |
author_sort | Han, Chenxi |
collection | PubMed |
description | The structural, mechanical, anisotropic, electronic, and thermal properties of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) in the tetragonal phase are systematically investigated in the present work. The mechanical stability is proved by the elastic constants of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4). Moreover, they all demonstrate brittleness, because B/G < 1.75, and v < 0.26. The elastic anisotropy of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) is characterized by Poisson’s ratio, Young’s modulus, the percentage of elastic anisotropy for bulk modulus A(B), the percentage of elastic anisotropy for shear modulus A(G), and the universal anisotropic index A(U). The electronic structures of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) are all wide band gap semiconductor materials, with band gaps of 4.26 eV, 3.94 eV, 3.83 eV, and 3.25 eV, respectively, when using the Heyd-Scuseria-Ernzerhof (HSE06) hybrid functional. Moreover, t-Ge(3)N(4) is a quasi-direct gap semiconductor material. The thermodynamic properties of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) are investigated utilizing the quasi-harmonic Debye model. The effects of temperature and pressure on the thermal expansion coefficient, heat capacity, Debye temperature, and Grüneisen parameters are discussed in detail. |
format | Online Article Text |
id | pubmed-5872976 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-58729762018-03-30 Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) Han, Chenxi Chai, Changchun Fan, Qingyang Yang, Jionghao Yang, Yintang Materials (Basel) Article The structural, mechanical, anisotropic, electronic, and thermal properties of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) in the tetragonal phase are systematically investigated in the present work. The mechanical stability is proved by the elastic constants of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4). Moreover, they all demonstrate brittleness, because B/G < 1.75, and v < 0.26. The elastic anisotropy of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) is characterized by Poisson’s ratio, Young’s modulus, the percentage of elastic anisotropy for bulk modulus A(B), the percentage of elastic anisotropy for shear modulus A(G), and the universal anisotropic index A(U). The electronic structures of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) are all wide band gap semiconductor materials, with band gaps of 4.26 eV, 3.94 eV, 3.83 eV, and 3.25 eV, respectively, when using the Heyd-Scuseria-Ernzerhof (HSE06) hybrid functional. Moreover, t-Ge(3)N(4) is a quasi-direct gap semiconductor material. The thermodynamic properties of t-Si(3)N(4), t-Si(2)GeN(4), t-SiGe(2)N(4), and t-Ge(3)N(4) are investigated utilizing the quasi-harmonic Debye model. The effects of temperature and pressure on the thermal expansion coefficient, heat capacity, Debye temperature, and Grüneisen parameters are discussed in detail. MDPI 2018-03-07 /pmc/articles/PMC5872976/ /pubmed/29518943 http://dx.doi.org/10.3390/ma11030397 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Han, Chenxi Chai, Changchun Fan, Qingyang Yang, Jionghao Yang, Yintang Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) |
title | Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) |
title_full | Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) |
title_fullStr | Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) |
title_full_unstemmed | Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) |
title_short | Structural, Electronic, and Thermodynamic Properties of Tetragonal t-Si(x)Ge(3−x)N(4) |
title_sort | structural, electronic, and thermodynamic properties of tetragonal t-si(x)ge(3−x)n(4) |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5872976/ https://www.ncbi.nlm.nih.gov/pubmed/29518943 http://dx.doi.org/10.3390/ma11030397 |
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