Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions

The initial corrosion process of copper and the corrosion resistance mechanism of Benzotriazole under chloride-containing thin electrolyte layer (TEL) was investigated. After theoretical calculation and experimental characterization, the forming process of [Cu(I)BTA](n) film was chemically adsorbed...

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Autores principales: Yi, Chenxi, Zhu, Benfeng, Chen, Yu, Du, Xiaoqing, Yang, Yumeng, Liu, Jiao, Zhang, Zhao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5884792/
https://www.ncbi.nlm.nih.gov/pubmed/29618834
http://dx.doi.org/10.1038/s41598-018-23927-w
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author Yi, Chenxi
Zhu, Benfeng
Chen, Yu
Du, Xiaoqing
Yang, Yumeng
Liu, Jiao
Zhang, Zhao
author_facet Yi, Chenxi
Zhu, Benfeng
Chen, Yu
Du, Xiaoqing
Yang, Yumeng
Liu, Jiao
Zhang, Zhao
author_sort Yi, Chenxi
collection PubMed
description The initial corrosion process of copper and the corrosion resistance mechanism of Benzotriazole under chloride-containing thin electrolyte layer (TEL) was investigated. After theoretical calculation and experimental characterization, the forming process of [Cu(I)BTA](n) film was chemically adsorbed on copper surface by Cu-N bond tightly; corrosion rate increased as TEL thickness decreased. Whilst, energy distribution plot of electrochemical noise provided the validity of corrosion type, and the purported corrosion energy (E(c)) deduced from electrochemical noise was approximately proportion to corrosion rate (1/R(ct)) with and without the anticorrosion film, which denoted the feasibility to determine corrosion rate by nondestructive on-line monitoring electrochemical noise progress.
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spelling pubmed-58847922018-04-09 Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions Yi, Chenxi Zhu, Benfeng Chen, Yu Du, Xiaoqing Yang, Yumeng Liu, Jiao Zhang, Zhao Sci Rep Article The initial corrosion process of copper and the corrosion resistance mechanism of Benzotriazole under chloride-containing thin electrolyte layer (TEL) was investigated. After theoretical calculation and experimental characterization, the forming process of [Cu(I)BTA](n) film was chemically adsorbed on copper surface by Cu-N bond tightly; corrosion rate increased as TEL thickness decreased. Whilst, energy distribution plot of electrochemical noise provided the validity of corrosion type, and the purported corrosion energy (E(c)) deduced from electrochemical noise was approximately proportion to corrosion rate (1/R(ct)) with and without the anticorrosion film, which denoted the feasibility to determine corrosion rate by nondestructive on-line monitoring electrochemical noise progress. Nature Publishing Group UK 2018-04-04 /pmc/articles/PMC5884792/ /pubmed/29618834 http://dx.doi.org/10.1038/s41598-018-23927-w Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Yi, Chenxi
Zhu, Benfeng
Chen, Yu
Du, Xiaoqing
Yang, Yumeng
Liu, Jiao
Zhang, Zhao
Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions
title Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions
title_full Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions
title_fullStr Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions
title_full_unstemmed Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions
title_short Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions
title_sort adsorption and protective behavior of btah on the initial atmospheric corrosion process of copper under thin film of chloride solutions
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5884792/
https://www.ncbi.nlm.nih.gov/pubmed/29618834
http://dx.doi.org/10.1038/s41598-018-23927-w
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