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High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures
2D layered materials (2DLMs), together with their heterostructures, have been attracting tremendous research interest in recent years because of their unique physical and electrical properties. A variety of circuit elements have been made using mechanically exfoliated 2DLMs recently, including hard...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5908369/ https://www.ncbi.nlm.nih.gov/pubmed/29721428 http://dx.doi.org/10.1002/advs.201700830 |
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author | Yan, Xiao Zhang, David Wei Liu, Chunsen Bao, Wenzhong Wang, Shuiyuan Ding, Shijin Zheng, Gengfeng Zhou, Peng |
author_facet | Yan, Xiao Zhang, David Wei Liu, Chunsen Bao, Wenzhong Wang, Shuiyuan Ding, Shijin Zheng, Gengfeng Zhou, Peng |
author_sort | Yan, Xiao |
collection | PubMed |
description | 2D layered materials (2DLMs), together with their heterostructures, have been attracting tremendous research interest in recent years because of their unique physical and electrical properties. A variety of circuit elements have been made using mechanically exfoliated 2DLMs recently, including hard drives, detectors, sensors, and complementary metal oxide semiconductor field‐effect transistors. However, 2DLM‐based amplifier circuit elements are rarely studied. Here, the integration of 2DLMs with 3D bulk materials to fabricate vertical junction transistors with current amplification based on a MoS(2)/GaTe heterostructure is reported. Vertical junction transistors exhibit the typical current amplification characteristics of conventional bulk bipolar junction transistors while having good current transmission coefficients (α ∼ 0.95) and current gain coefficient (β ∼ 7) at room temperature. The devices provide new attractive prospects in the investigation of 2DLM‐based integrated circuits based on amplifier circuits. |
format | Online Article Text |
id | pubmed-5908369 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | John Wiley and Sons Inc. |
record_format | MEDLINE/PubMed |
spelling | pubmed-59083692018-05-02 High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures Yan, Xiao Zhang, David Wei Liu, Chunsen Bao, Wenzhong Wang, Shuiyuan Ding, Shijin Zheng, Gengfeng Zhou, Peng Adv Sci (Weinh) Communications 2D layered materials (2DLMs), together with their heterostructures, have been attracting tremendous research interest in recent years because of their unique physical and electrical properties. A variety of circuit elements have been made using mechanically exfoliated 2DLMs recently, including hard drives, detectors, sensors, and complementary metal oxide semiconductor field‐effect transistors. However, 2DLM‐based amplifier circuit elements are rarely studied. Here, the integration of 2DLMs with 3D bulk materials to fabricate vertical junction transistors with current amplification based on a MoS(2)/GaTe heterostructure is reported. Vertical junction transistors exhibit the typical current amplification characteristics of conventional bulk bipolar junction transistors while having good current transmission coefficients (α ∼ 0.95) and current gain coefficient (β ∼ 7) at room temperature. The devices provide new attractive prospects in the investigation of 2DLM‐based integrated circuits based on amplifier circuits. John Wiley and Sons Inc. 2018-01-15 /pmc/articles/PMC5908369/ /pubmed/29721428 http://dx.doi.org/10.1002/advs.201700830 Text en © 2018 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Communications Yan, Xiao Zhang, David Wei Liu, Chunsen Bao, Wenzhong Wang, Shuiyuan Ding, Shijin Zheng, Gengfeng Zhou, Peng High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures |
title | High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures |
title_full | High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures |
title_fullStr | High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures |
title_full_unstemmed | High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures |
title_short | High Performance Amplifier Element Realization via MoS(2)/GaTe Heterostructures |
title_sort | high performance amplifier element realization via mos(2)/gate heterostructures |
topic | Communications |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5908369/ https://www.ncbi.nlm.nih.gov/pubmed/29721428 http://dx.doi.org/10.1002/advs.201700830 |
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